Copper and copper oxides (Cu2O and CuO) have been deposited by evaporation of copper and subsequent
oxidizing treatments, on the surface of flat SiO2 and ZrO2 substrates. Large variations of several eVs have
been found in the values of the Cu 2p3/2 binding energy (BE) and Auger parameter (α‘) of copper as a function
of the amount of deposited metallic copper or copper oxides. The magnitude of the changes was also dependent
on the type of support upon which the experiment was carried out. These changes have been attributed to
modifications in the factors contributing to the initial and final state effects of the process, according to the
dispersion degree and the nature of the interactions between the copper oxide moieties and the support. All
of these changes can be systematized with the help of chemical state plots. Experiments carried out with real
catalysts stress the need of such plots, which summarize the results obtained with the model systems, for a
proper characterization of the supported oxide phases in this kind of real materials.
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