2010
DOI: 10.1016/j.tsf.2009.09.139
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Single-crystalline Si grown on single-crystalline Gd2O3 by modified solid-phase epitaxy

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Cited by 23 publications
(10 citation statements)
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“…9 In this context, REOs not only demonstrate diverse functions beyond conventional semiconductor functionality such as the use as diluted magnetic semiconductors. 10 They can also be used as buffers for the integration of other functional layers such as superconductive, 11 ferromagnetic 12 and multiferroic 13 oxides as well as semiconductors like Si, 14 Ge 15 and III-V 16 grown on Si.…”
Section: Introductionmentioning
confidence: 99%
“…9 In this context, REOs not only demonstrate diverse functions beyond conventional semiconductor functionality such as the use as diluted magnetic semiconductors. 10 They can also be used as buffers for the integration of other functional layers such as superconductive, 11 ferromagnetic 12 and multiferroic 13 oxides as well as semiconductors like Si, 14 Ge 15 and III-V 16 grown on Si.…”
Section: Introductionmentioning
confidence: 99%
“…5,6 Extensive studies have been conducted and high quality epitaxial growth of Gd 2 O 3 (111) on Si(111) has been reported together with the method of growing a double-barrier quantum structure by Osten's and Fissel's group. 7,8 They also reported an epitaxial growth of (110)-oriented Gd 2 O 3 on Si(100). A sub-nanometer capacitance equivalent oxide thickness has been obtained with this structure.…”
mentioning
confidence: 95%
“…This leads to three-dimensional Volmer-Weber growth mode as can be noted from RHEED pattern of the germanium just after the start of growth [ Fig. 30 Consequently, the same reasons determine A/B stacking sequence in case of silicon or germanium growth on the metal oxide as was denoted by Fissel et al 31 The energetically preferred single A-oriented Ge islands should be formed on rare-earth metal oxide at lower temperatures-for example, by crystallization from amorphous phase during surfactant mediated solid phase epitaxy of Ge on lanthanum yttrium oxide as was shown by Bojarczuk et al 7 In work of Giussani et al, 18 it was demonstrated epitaxy of a single crystal germanium layer on praseodymium oxide buffer at optimized process conditions. The double spots in the pattern indicate formation of twinned germanium islands that also takes place during silicon epitaxy on gadolinium oxide.…”
Section: Resultsmentioning
confidence: 81%