2016
DOI: 10.1063/1.4962096
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Single and multi-junction solar cells utilizing a 1.0 eV SiGeSn junction

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Cited by 11 publications
(7 citation statements)
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“…The lower current value calculated in our simulation, and therefore, the lower efficiency value can be mainly attributed to the utilization of a SiO 2 /Ta 2 O 5 coating instead of the MgF2/ZnS one, as utilized in Wilson et al Since the SiO 2 /Ta 2 O 5 planar coating did not show optimized reflectance values in the wavelength range where the SiGeSn and Ge sub cells are active, this condition forced to limit the thickness of the InGaP and InGaAs junctions and then the overall current. It is straightforward to check that by assuming the same MgF 2 /ZnS coating, in order to reach the same current density measured by Wilson et al and preserving the high fill factor value obtained in our simulation (by considering an InGaAs limited QJ cell), our calculation would show an efficiency value potentially over 50%, in agreement with the simulation reported by Kurtz et al and by Geisz and Friedman on QJ cells with a 1‐eV E g third junction. Overcoming the 50% efficiency threshold is of course a major goal for present‐day research on MJ solar cells.…”
Section: Simulation Of the Performances Of Ingap/ingaas/sigesn/ge Solsupporting
confidence: 89%
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“…The lower current value calculated in our simulation, and therefore, the lower efficiency value can be mainly attributed to the utilization of a SiO 2 /Ta 2 O 5 coating instead of the MgF2/ZnS one, as utilized in Wilson et al Since the SiO 2 /Ta 2 O 5 planar coating did not show optimized reflectance values in the wavelength range where the SiGeSn and Ge sub cells are active, this condition forced to limit the thickness of the InGaP and InGaAs junctions and then the overall current. It is straightforward to check that by assuming the same MgF 2 /ZnS coating, in order to reach the same current density measured by Wilson et al and preserving the high fill factor value obtained in our simulation (by considering an InGaAs limited QJ cell), our calculation would show an efficiency value potentially over 50%, in agreement with the simulation reported by Kurtz et al and by Geisz and Friedman on QJ cells with a 1‐eV E g third junction. Overcoming the 50% efficiency threshold is of course a major goal for present‐day research on MJ solar cells.…”
Section: Simulation Of the Performances Of Ingap/ingaas/sigesn/ge Solsupporting
confidence: 89%
“…The performance obtained on the 2T InGaP/InGaAs/SiGeSn/Ge QJ has also been compared with those published by Wilson at al, under AM1.5D illumination at 1000 sun concentration and considering a 4% grid shadowing. The one‐sun current density and efficiency values calculated in were respectively 13.9 mA/cm 2 and 48.6% versus 12.5 mA/cm 2 and 45.1 % calculated in this contribution. The lower current value calculated in our simulation, and therefore, the lower efficiency value can be mainly attributed to the utilization of a SiO 2 /Ta 2 O 5 coating instead of the MgF2/ZnS one, as utilized in Wilson et al Since the SiO 2 /Ta 2 O 5 planar coating did not show optimized reflectance values in the wavelength range where the SiGeSn and Ge sub cells are active, this condition forced to limit the thickness of the InGaP and InGaAs junctions and then the overall current.…”
Section: Simulation Of the Performances Of Ingap/ingaas/sigesn/ge Solmentioning
confidence: 51%
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“…Initially, the SiGeSn alloys were grown with an ultra-high vacuum CVD on 4-inch Ge (100) substrates, with a miscut of 6° towards the <111> plane to reduce the formation of anti-phase boundaries in the subsequent MOCVD growth [6]. Before the 1.0 eV SiGeSn layer, a highly doped SiGeSn acting as back surface field was grown in order to limit the diffusion of minority carriers into the Ge inactive substrate [5].…”
Section: Methodsmentioning
confidence: 99%
“…Furthermore, this ternary material can be used as an intermediate buffer layer to realize monolithic III-V structure on silicon substrate, paving the path for next generation low cost MJ devices [13]. In spite of these encouraging prospective, the most recent integrations of SiGeSn with III-V for MJ solar cells have been accomplished by using two different growth equipment: a CVD reactor for the growth of SiGeSn and a MOVPE growth chamber for the deposition of the remaining part of the cell structure [14], [15]. The reason for such a choice is mostly due to the "cross contamination" among the III-V elements and the IV elements of the periodic table [16].…”
Section: Introductionmentioning
confidence: 99%