2014 IEEE Computer Society Annual Symposium on VLSI 2014
DOI: 10.1109/isvlsi.2014.79
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Simultaneous Two-Dimensional Cell Layout Compaction Using MILP with ASTRAN

Abstract: This paper describes a technique to compact cell layouts efficiently using Mixed-Integer Linear Programming. By using binary variables we were able not only to model the conditional design rules, which apply to technology nodes down to 65nm, but also to compact layouts in the two-dimensions simultaneously. This technique was applied to a transistor network layout synthesis tool called ASTRAN which is being used to generate on-demand cells with unrestricted transistor network structure. We demonstrate in this p… Show more

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Cited by 19 publications
(4 citation statements)
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“…Then, if there is any FET be placed in i th cell row or the cell row larger than i, the W i is set to W max . Otherwise, the W i is 0 as described in (8). With (8), we can minimize the cell area with the considerations of single-row and multi-row structures simultaneously.…”
Section: Multi-row Cell Area Minimizationmentioning
confidence: 99%
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“…Then, if there is any FET be placed in i th cell row or the cell row larger than i, the W i is set to W max . Otherwise, the W i is 0 as described in (8). With (8), we can minimize the cell area with the considerations of single-row and multi-row structures simultaneously.…”
Section: Multi-row Cell Area Minimizationmentioning
confidence: 99%
“…In this section, we compare the SDC areas of adaptive cell row number, triple-row (TR), double-row (DR), and single-row (SR) [17] in 2.5T CFET cell structure. For demonstrating the cell area benefit of adaptive cell row SDC structure while synthesizing each SDC, we use objective (9) and equation (8) to generate the minimum cell area with optimum cell row (Opt. CR) in our framework.…”
Section: B Cell Area Minimization With Adaptive Cell Row Numbermentioning
confidence: 99%
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“…SDC Synthesis Automation. In [9,25], authors reported full automation of cell layout covering transistor-level placement and in-cell routing together, but these approaches are not applicable in the multi-patterning technologies in sub-5nm. For multi-patterning technology nodes, [7,10,12] proposed SDC synthesis automation, but the placement and routing are performed in separate operations.…”
Section: Introductionmentioning
confidence: 99%