In 8-to 20-keV photon energy region, ruthenium and carbon thin films are used in multilayer monochromators. In the present study, this material combination is explored for X-ray waveguide applications in hard X-ray region. The structural parameters (thickness of each layer) of Ru/C/Ru waveguide structure are optimized to get maximum intensity enhancement of fundamental mode inside carbon guiding layer. A sample with optimized structural parameters is deposited using ion beam sputtering (IBS) technique and characterized using X-ray reflectivity (XRR) and grazing incidence X-ray fluorescence (GIXRF) techniques. The analysis suggests that the density of bottom Ru layer and carbon guiding layer is close to bulk density ($97% for Ru and $95% for carbon), whereas density of top Ru layer is slightly lower ($93% of bulk density). A $10% of thickness variation in top cladding layer along with marginal change in layer density deteriorate field enhancement in TE 0 mode by more than three times. Effect of thickness and density variation on waveguide (Ru [7 nm]/C [18 nm]/Ru [20 nm]) performance is discussed.