Multilayer
nanolaminates (NLs) of alternate ultrathin sublayers
of Al2O3 and TiO2 (ATA) with the
thickness ranging ∼2 to 0.5 nm were fabricated by optimized
pulsed laser deposition (PLD). Maxwell–Wagner (M–W)
relaxation-induced interfacial polarization was realized and engineered
by precisely controlling the sublayer thicknesses and the number of
interfaces. X-ray reflectivity and cross-sectional transmission electron
microscopy measurements of ATA NLs revealed an artificial periodicity
with well-defined uniformly thick amorphous sublayers with chemically
and physically distinct interfaces down to a sublayer thickness of
∼0.8 nm. The dielectric constants and loss of ATA NLs were
found to increase from ∼60 to 670 and decrease from ∼0.9
to 0.16, respectively, as sublayer thicknesses reduced from ∼2
to 0.8 nm. However, for a sublayer thickness below 0.8 nm, the trend
was reversed. Furthermore, temperature-dependent impedance spectroscopy
studies revealed two distinct thermally activated relaxation processes,
corresponding to TiO2 and Al2O3 sublayers,
corroborating the M–W relaxation. The conductivity contrast
between the sublayers of ATA NLs enhanced with reducing sublayer thickness
and plateaued at a sublayer thickness of ∼0.8 nm, resulting
in dominant M–W interfacial polarization and a high cut-off
frequency of ∼50 kHz. These results demonstrate that ATA NLs
grown by PLD may find application as potential high-k materials for next-generation nanoelectronic devices.