Proceedings of the 8th Spanish Conference on Electron Devices, CDE'2011 2011
DOI: 10.1109/sced.2011.5744251
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Simulation of Total Ionising Dose in MOS capacitors

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Cited by 15 publications
(14 citation statements)
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“…We believe that the accelerated degradation under reverse bias has two reasons. First, the yield Y of electron-hole pairs that escape prompt recombination, given by [23]…”
Section: Discussionmentioning
confidence: 99%
“…We believe that the accelerated degradation under reverse bias has two reasons. First, the yield Y of electron-hole pairs that escape prompt recombination, given by [23]…”
Section: Discussionmentioning
confidence: 99%
“…The effects of oxidetrap charges and interface trap charges on the varactors with respect to bias voltage are analyzed in detail in [42]. During irradiation, the radiation induced negative charges (oxide-trap and interface trap) result into reduction of the width of the depletion region, which in turn increases the capacitance of the varactors [29,43]. This radiation-induced effect is counteracting previous g m induced increase in frequency.…”
Section: Resultsmentioning
confidence: 99%
“…Other, smaller contributions may come from the shaping stage, as discussed later on). At higher total ionizing doses, the further increase of positive charge concentration in the oxide bulk is likely to be compensated by the increase in interface trap concentration [12], hence accounting for the much smaller variation detected in the signal amplitude after the second and the last irradiation steps. As far as the shaping stage is concerned, a shift in the threshold voltage of the N-type transistor M 2 in the current mirror feedback network may determine a change in the mirror ratio, therefore explaining the faster return to baseline of the signal detected after irradiation with 1 Mrad(SiO 2 ) and 3 Mrad(SiO 2 ) γ-ray doses.…”
Section: B Tests With γ-Raysmentioning
confidence: 99%
“…The device can only be operated in accumulation (right region of the characteristic) or depletion mode (left region). Radiation-induced trapping of holes in the oxide of the capacitor structure may be responsible for shifting the characteristic towards the left, since the increase of the positive charge density in the oxide, for a given DC voltage, would push the device closer to (or deeper into) the accumulation region [12]. Since in the charge preamplifier, the DC voltage of the C F capacitor is held to 0 by the feedback network, positive charge accumulation in the oxide would lead to an increase in the capacitance.…”
Section: B Tests With γ-Raysmentioning
confidence: 99%