This paper studies the overload turnoff failure in the insulated-gate bipolar transistor (IGBT) devices of power multichip modules for railway traction. After a detailed experimental analysis carried out through a dedicated test circuit, electrothermal simulations at device level are also presented. The simulation strategy has consisted in inducing a current and temperature mismatch in two IGBT cells. Results show that mismatches in the electrothermal properties of the IGBT device during transient operation can lead to uneven power dissipation, significantly enhancing the risk of failure and reducing the lifetime of the power module. Concretely, simulations qualitatively demonstrate that localized hot-spot formation due to a dynamic breakdown could lead to a second breakdown mechanism.Index Terms-Insulated-gate bipolar transistor (IGBT) power module, power inverter reliability, railway applications, semiconductor device breakdown, semiconductor device thermal factors.

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In this work, SiO2/GaN MOS structures have been fabricated using Electron Cyclotron Resonance Plasma Enhanced Chemical Vapor Deposition (ECR-PECVD) for deposition of silicon dioxide (SiO2) at low temperature (300 °C) on N-type, NID and P-type GaN epitaxial layers. Surface preparation involving chemical, UV-Ozone oxidation and oxygen plasma oxidation have been investigated by XPS analysis of the GaN surfaces prior to SiO2 deposition. The association of UV ozone and plasma oxidation allows a complete removal of carbon contamination and has a huge beneficial effect on the quality of the SiO2/GaN interface. Electrical C-V characterizations put into evidence the improved quality of the SiO2/GaN interface with a low interface trap density of 1010 cm−2 eV−1. The advantage of this soft interface treatment is thus specially observed for the N-type samples without annealing step, whereas improvements are still needed in the case of NID and P-type samples.