Simulation of the effect of argon pressure on thermal processes in the sputtering unit of a magnetron with a hot target

Шаповалов, В. М.; Ahmedov, H.; Kozin, A A; Demir, A.; Korutlu, Beste

doi:10.1016/j.vacuum.2021.110421

Cited by 5 publications

(2 citation statements)

References 30 publications

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“…In this case, computer simulation significantly reduces development time and cost and eliminates errors. Several research papers have addressed the modelling and simulation of the magnetron sputtering process, some with reactive sputtering systems and others with target erosion processes [20][21][22][23]. However, magnetron sputtering of mosaic targets has been the subject of relatively few studies, as there is no published work on a numerical method using particle-in-cell/Monte Carlo collision simulation (PIC /MCC), which has been used extensively to study the fundamental process of a static plasma discharge [24][25][26].…”

Section: Introductionmentioning

confidence: 99%

2D Particle-in-Cell/Monte Carlo Collision Simulation of Zn-C Mosaic Target Erosion

Addie¹,

Ismail²,

Mohammed³

2022

JASN

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In this work, a simulation analysis of a commercial magnetron sputtering source was performed using the finite element method Particle-in-Cell/Monte Carlo Collision (PIC/MCC) to optimize the configuration of the Zn-C mosaic target. The magnetic field distribution was solved in a two-dimensional cylindrical coordinate system, and particles such as electrons, atoms, and charged ions of argon, zinc, and carbon were tracked in a DC magnetron sputtering system. The sputtering yield profile and particle flux for the eroded target were studied considering the ion and electron density distributions. The maximum sputtering flux of zinc and carbon was 1.97510 21 m -2 .s -1 and 3.710 18 m -2 .s -1 respectively. The erosion position of a target was predicted based on the maximum power density distribution at the surface of the target. The accuracy of the simulation was checked by comparing it with the measurement of the target eroded after several hours of sputtering. However, as for the Zn-C mosaic target, the racetrack was identical to the analysis predicted by the numerical simulation process. The results of this work can be used as a guide for designing mosaic targets and optimizing their use for fabricating nanohybrid thin film structures.

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Section: Introductionmentioning

confidence: 99%

2D Particle-in-Cell/Monte Carlo Collision Simulation of Zn-C Mosaic Target Erosion

Addie¹,

Ismail²,

Mohammed³

2022

JASN

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“…When performing calculations on the optical spectra of the discharge, the dependence of the effective temperature T t 2 (j + t 2 ) on the ion current density of the external plate j +t 2 was determined [200]:…”

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confidence: 99%

Modeling of Reactive Sputtering—History and Development

Шаповалов

2023

Materials

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This work critically reviews the evolution of reactive sputtering modeling that has taken place over the last 50 years. The review summarizes the main features of the deposition of simple metal compound films (nitrides, oxides, oxynitrides, carbides, etc.) that were experimentally found by different researchers. The above features include significant non-linearity and hysteresis. At the beginning of the 1970s, specific chemisorption models were proposed. These models were based on the assumption that a compound film was formed on the target due to chemisorption. Their development led to the appearance of the general isothermal chemisorption model, which was supplemented by the processes on the surfaces of the vacuum chamber wall and the substrate. The model has undergone numerous transformations for application to various problems of reactive sputtering. At the next step in the development of modeling, the reactive sputtering deposition (RSD) model was proposed, which was based on the implantation of reactive gas molecules into the target, bulk chemical reaction, chemisorption, and the “knock-on effect”. Another direction of the modeling development is represented by the nonisothermal physicochemical model, in which the Langmuir isotherm and the law of mass action are used. Various modifications of this model allowed describing reactive sputtering processes in more complex cases when the sputtering unit included a hot target or a sandwich one.

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Study of Plasma Particle Distribution and Electron Temperature in Cylindrical Magnetron Sputtering

Fu,

Ji,

et al. 2023

Plasma Chem Plasma Process

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Simulation of the effect of argon pressure on thermal processes in the sputtering unit of a magnetron with a hot target

Cited by 5 publications

References 30 publications

2D Particle-in-Cell/Monte Carlo Collision Simulation of Zn-C Mosaic Target Erosion

2D Particle-in-Cell/Monte Carlo Collision Simulation of Zn-C Mosaic Target Erosion

Modeling of Reactive Sputtering—History and Development

Study of Plasma Particle Distribution and Electron Temperature in Cylindrical Magnetron Sputtering

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