2010
DOI: 10.1002/jnm.736
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Simulation of femtosecond pulsed laser effects on MOS electronics using TCAD Sentaurus customized models

Abstract: SUMMARYPulsed laser illumination constitutes an excellent tool to emulate the effects produced by the impact of highly energetic particles on electronic circuits. Numerical simulation techniques could be used to study these effects and to establish accurate relationships between the laser parameters and the particle characteristics. Unfortunately, although particle incidence can be accurately simulated, up to now, there not exist a simulation technique able to reproduce completely the effects in electronics pr… Show more

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Cited by 5 publications
(3 citation statements)
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“…The eph generation due to the photon absorptions within de depleted p d -layer is a transient mechanism which could be simulated by using the heavy ions models included in Sentaurus TCAD tools [3]. However, the excessive number of device parameters taken into account for the design optimization demands an elevated number of simulations.…”
Section: Gain Prediction Methodologymentioning
confidence: 99%
“…The eph generation due to the photon absorptions within de depleted p d -layer is a transient mechanism which could be simulated by using the heavy ions models included in Sentaurus TCAD tools [3]. However, the excessive number of device parameters taken into account for the design optimization demands an elevated number of simulations.…”
Section: Gain Prediction Methodologymentioning
confidence: 99%
“…They are listed as [2][3][4][5][6][7][8][9][10][11][12]. Particular attention was paid for showing the most representative contributions of each conference topic.…”
Section: Photovoltaic Optoelectronic Devices and Displays (21 Contrimentioning
confidence: 99%
“…Technology computer-aided design (TCAD), which integrates process, device, and circuit simulators, has become indispensable for semiconductor device manufacturing. [1][2][3][4][5] TCAD is used to predict semiconductor device performance under given structural and process parameters and to optimize manufacturing DOI: 10.1002/adts.202300218 conditions. As semiconductor device sizes have become smaller in recent years, the number of process steps has increased, making TCAD more time-consuming.…”
Section: Introductionmentioning
confidence: 99%