Silicon-Based 2-D Slab Photonic Crystal TM Polarizer at Telecommunication Wavelength

Cui, Yonghao; Wu, Qi; Schonbrun, Ethan; Tinker, Mark; Lee, Jeong; Park, Won

doi:10.1109/lpt.2008.919508

Cited by 37 publications

(31 citation statements)

References 9 publications

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“…This TM polarizer configuration is an alternative to the other reported polarizer based on corrugated waveguide [12], photonics crystal waveguide [13], slotted waveguide [14], and sandwiched waveguide [15] structures. The major advantage of our proposed waveguide structure in the TM 0 and TE 0 modes segregation is evident from the smallest reported foot-print and sub-micron length features.…”

Section: Structure Considerations Results and Discussionmentioning

confidence: 99%

Integrated Cu-based TM-pass polarizer using CMOS technology platform

Khan

Boon

2010

2010 Photonics Global Conference

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-A transverse-magnetic-pass (TM-pass) copper (Cu) polarizer is proposed and analyzed using the previously published two-dimensional Method-of-Lines beam-propagation model. The proposed polarizer exhibits a simulated high-pass filter characteristics, with TM 0 and TE 0 mode transmissivity of >70% and <5%, respectively, in the wavelength regime of 1.2 -1.6 μm. The polarization extinction ratio (PER) given by 10 log 10 (PTM 0 )/(PTE 0 ) is +11.5 dB across the high-pass wavelength regime. To the best of the authors' knowledge, we report here the smallest footprint CMOSplatform compatible TM-polarizer.

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Section: Structure Considerations Results and Discussionmentioning

confidence: 99%

Integrated Cu-based TM-pass polarizer using CMOS technology platform

Khan

Boon

2010

2010 Photonics Global Conference

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“…High refractive index contrast makes silicon waveguides highly polarization dependent. To address this issue, various types of passive polarization management components have been reported recently, including polarization splitters [2,3], rotators [4][5][6][7][8][9][10] and polarizers [11][12][13][14][15][16]. Among them, polarizers which simply filter the undesired polarization state are suitable for many applications.…”

Section: Introductionmentioning

confidence: 99%

“…However, such devices generally have a comparatively large excess loss and the fabrication process involving metals restricts their applications. Polarizers based on photonic-crystal (PhC) structures are also typically lossy and sensitive to fabrication errors [13]. On the other hand, a waveguide polarizer with partially etched waveguides is easier to fabricate, but it tends to be a long structure, on the order of 1 mm [14].…”

Section: Introductionmentioning

confidence: 99%

High Extinction Ratio and Broadband Silicon TE-Pass Polarizer Using Subwavelength Grating Index Engineering

Xiong

Schmid

et al. 2015

IEEE Photonics J.

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/npsi/ctrl?lang=en http://nparc.cisti-icist.nrc-cnrc.gc.ca/npsi/ctrl?lang=fr READ THESE TERMS AND CONDITIONS CAREFULLY BEFORE USING THIS WEBSITE.http://nparc.cisti-icist.nrc-cnrc.gc.ca/npsi/jsp/nparc_cp.jsp?lang=en Vous avez des questions? Nous pouvons vous aider. Pour communiquer directement avec un auteur, consultez la première page de la revue dans laquelle son article a été publié afin de trouver ses coordonnées. Si vous n'arrivez pas à les repérer, communiquez avec nous à PublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca. Questions?Contact the NRC Publications Archive team at PublicationsArchive-ArchivesPublications@nrc-cnrc.gc.ca. If you wish to email the authors directly, please see the first page of the publication for their contact information. NRC Publications Archive Archives des publications du CNRCThis publication could be one of several versions: author's original, accepted manuscript or the publisher's version. / La version de cette publication peut être l'une des suivantes : la version prépublication de l'auteur, la version acceptée du manuscrit ou la version de l'éditeur. For the publisher's version, please access the DOI link below./ Pour consulter la version de l'éditeur, utilisez le lien DOI ci-dessous. This article has been accepted for publication in a future issue of this journal, but has not been fully edited. Content may change prior to final publication. We propose and experimentally demonstrate a novel approach to implement a low loss, broadband and compact transverse electric (TE)-pass polarizer on a silicon-on-insulator (SOI) platform. The TE-polarizer utilizes a subwavelength grating (SWG) structure to engineer the waveguide equivalent material index. In this work, the SWG-based polarizer only supports its fundamental TE mode while the transverse magnetic (TM) mode is suppressed under the cut-off condition, i.e., the TM mode leaks from the waveguide with a low reflection. The simulations predict that the bandwidth to achieve a polarization extinction ratio (ER) of 35 dB exceeds 200 nm. Experimentally, the measured polarization ER is ~30 dB and the average insertion loss is 0.4 dB, in the wavelength range 1470 nm -1580 nm. The fabricated TE-polarizer has a compact length of 60 µm.

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“…Critical feature sizes of the photonic crystals scale with the wavelength of the electromagnetic waves. For the telecommunication C band around a 1550-nm wavelength widely used in fiber optic communications, two-dimensional (2D) photonic crystals would need critical feature sizes in the deep sub-micron range [9,10], while they need to have a much larger scale (e.g., micron scale or larger) features in the same devices.…”

Section: Introductionmentioning

confidence: 99%

“…In order to test the potential of the CNP method as a simultaneous one-step lithography, a 2D slab silicon photonic crystal transverse magnetic (TM) polarizer [10], one of our previous works, was used as an example for this work. The previous work was fabricated by a combination of conventional photolithography for micron-scale features and focused ion beam (FIB) milling for sub-micron-scale features.…”

Section: Introductionmentioning

confidence: 99%

One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer

et al. 2014

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Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.

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Silicon-Based 2-D Slab Photonic Crystal TM Polarizer at Telecommunication Wavelength

Cited by 37 publications

References 9 publications

Integrated Cu-based TM-pass polarizer using CMOS technology platform

Integrated Cu-based TM-pass polarizer using CMOS technology platform

High Extinction Ratio and Broadband Silicon TE-Pass Polarizer Using Subwavelength Grating Index Engineering

One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer

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