1981
DOI: 10.1016/0040-6090(81)90060-2
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SiC synthesis by a plasma deposition process

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Cited by 36 publications
(10 citation statements)
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“…Their applications may range from protective coatings against corrosion of steel 5,6 to microelectronic devices 7 and from X ray mask materials 8 to protection of thermonuclear reactor walls 9 , among others. These films can be deposited by a variety of techniques such as laser assisted deposition 10 , dynamic ion mixing 11 , plasma enhanced chemical vapor deposition 12 , magnetron sputtering 2 and many others. From the various possible choices, magnetron sputtering appears to be a very attractive one due to its relative simplicity, high attainable deposition rates and wide acceptance by industry.…”
Section: Introductionmentioning
confidence: 99%
“…Their applications may range from protective coatings against corrosion of steel 5,6 to microelectronic devices 7 and from X ray mask materials 8 to protection of thermonuclear reactor walls 9 , among others. These films can be deposited by a variety of techniques such as laser assisted deposition 10 , dynamic ion mixing 11 , plasma enhanced chemical vapor deposition 12 , magnetron sputtering 2 and many others. From the various possible choices, magnetron sputtering appears to be a very attractive one due to its relative simplicity, high attainable deposition rates and wide acceptance by industry.…”
Section: Introductionmentioning
confidence: 99%
“…Figure 2 plots the integrated intensities of these bonds as a function of x for the asprepared and oxidized samples. For the as-prepared films, the intensities of Si-C and Si-H bonds reduce, and Si-CH 3 increases as x increases from 0.3 to 0.8. Weider et al 18 have also reported an increase in the Si-CH 3 and a decrease in Si-C absorption intensities from their a-Si 1Ϫx C x :H films as x increases from ϳ0.3 to 0.8.…”
Section: Resultsmentioning
confidence: 99%
“…Most of the research on a-Si 1Ϫx C x :H films is on the optical and structural properties of this material. 1,2 On the other hand, there are other applications of a-Si 1Ϫx C x :H films, such as passivation of electrical devices, 3,4 coating material for glass and metal for ultraviolet optics, 5 and as a masking material for micromechanical devices. 6 Most of these applications required the films to possibly go through a high temperature process in an inert or oxidizing ambient.…”
Section: Introductionmentioning
confidence: 99%
“…As potential candidates for the mechanical, electronic, and biomedical applications, thin films of amorphous carbon and related materials have attracted much attention. 1,2) Among them, amorphous silicon carbides (a-SiC x ) and hydrogenated a-SiC x (a-SiC x :H) have been expected for the applications of protective coatings, [3][4][5][6][7] solar cells, 8,9) low frictions, 4,10,11) and biocompatibilities. 12) Recently, the standardizations of amorphous carbon and related materials including a-SiC x (:H) have been promoted in Japan for the industrial applications of these materials.…”
Section: Introductionmentioning
confidence: 99%