Shaped beam technique using a novel 3rd-order imaging approach

Kotsugi, Tadashi; Fuse, Takashi; Kinoshita, Haruhisa; Parker, N. W.

doi:10.1117/12.771753

Cited by 4 publications

(1 citation statement)

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“…This concept, called the third-order imaging technique, obtains steep edge acuity for fine lithographic patterns and high current density, which shortens exposure time, as compared with conventional shaped beam methods. 5,6) In addition, this concept does not need a complicated column structure to correct for aberrations. These characteristics are suitable for developing to multicolumn equipment from an engineering point of view.…”

Section: Introductionmentioning

confidence: 99%

Development of Multibeam Electron Beam Direct Writing System Using Third-Order Imaging Technique

Fuse¹,

Kotsugi²,

Takeya³

et al. 2009

jjap

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We report the development of a new electron beam direct writing (EBDW) system embodying a concept that can realize both high throughput and fine resolution. The equipment has a multicolumn system with the third-order imaging technology, which obtains steep edge acuity with high current density as compared with conventional shaped beam methods. We attempt to apply this to via/contact layers, for which it is difficult to obtain resist patterns using any optical lithography systems. We also showed proof of concept of third-order imaging serving as a technique for simultaneously satisfying improvement in current density without beam blur and forming a beam to a desired shape. The advantage of the third-order imaging technique is a potential solution that may break through the technological impasse of high current density versus high resolution. We are currently engaged in enhancing the high-acceleration-energy and multicolumn system and in its development for mass production.

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Section: Introductionmentioning

confidence: 99%