A UV emission spectrometer using a non-periodic spherical grating has been designed, which can be attached to the linear or helical undulator beamlines of the HiSOR light source at the Hiroshima Synchrotron Radiation Centre. The useful range of emitted photons from 10 to 100 eV is covered by two gratings with nominal groove spacings of 1/600 and 1/1200 mm. The energy resolution with a 100 mm entrance slit width and the 1/600 mm grating is better than 0.2 eV below 50 eV.
We proposed an electron beam direct writing (EBDW) system capable of high throughput and maskless operation based on a novel concept of using both low-energy electron beam (EB) and character projection (CP) system. We fabricated an EB optical column of low-energy EBDW equipment and obtained a resist pattern. We also investigated the beam blur and line width roughness (LWR) of lines and spaces (L/S) formed on a resist to change various EB current densities and convergence half angles. The obtained results show that a Coulomb interaction effect markedly affects the beam blur in our EB optical column. Thus, we reduce the number of sources caused by LWR and developed photoresists to obtain small LWR L/S patterns for achieving a high throughput.
We report the development of a new electron beam direct writing (EBDW) system embodying a concept that can realize both high throughput and fine resolution. The equipment has a multicolumn system with the third-order imaging technology, which obtains steep edge acuity with high current density as compared with conventional shaped beam methods. We attempt to apply this to via/contact layers, for which it is difficult to obtain resist patterns using any optical lithography systems. We also showed proof of concept of third-order imaging serving as a technique for simultaneously satisfying improvement in current density without beam blur and forming a beam to a desired shape. The advantage of the third-order imaging technique is a potential solution that may break through the technological impasse of high current density versus high resolution. We are currently engaged in enhancing the high-acceleration-energy and multicolumn system and in its development for mass production.
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