2009
DOI: 10.1016/j.solmat.2008.01.007
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SEM analysis and selenization of Cu–In alloy films produced by co-sputtering of metals

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Cited by 55 publications
(31 citation statements)
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“…As Fig. 4 also indicates, the CIS grain formation during the extended selenization favors the (1 1 2) preferred orientation at 400 1C, and similar results were reported in earlier works [14,15]. Even the CIS (2 2 0/2 0 4)-preferred film will be transformed into a (1 1 2)-preferred one with prolonged selenization [24], and these results suggest that a short duration of 400 1C selenization is essential to avoid the growth of a (1 1 2)-preferred CIS film.…”
Section: Influence Of the First-step Selenization On Cis Crystallizationsupporting
confidence: 89%
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“…As Fig. 4 also indicates, the CIS grain formation during the extended selenization favors the (1 1 2) preferred orientation at 400 1C, and similar results were reported in earlier works [14,15]. Even the CIS (2 2 0/2 0 4)-preferred film will be transformed into a (1 1 2)-preferred one with prolonged selenization [24], and these results suggest that a short duration of 400 1C selenization is essential to avoid the growth of a (1 1 2)-preferred CIS film.…”
Section: Influence Of the First-step Selenization On Cis Crystallizationsupporting
confidence: 89%
“…Only a strong (0 0 2) diffraction peak of AZO film is observed, and the co-sputtered Cu/In precursor layer is an amorphous film. The precursor film is different from most reported in the literature, in which the co-sputtered precursor has Cu-In binary phases, such as Cu 11 In 9 [12][13][14][15]. In this study, the as-deposited Cu-In precursor film has rounded grains 300-500 nm in diameter and with a rough surface, as the inset picture shown.…”
Section: Resultsmentioning
confidence: 58%
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“…Despite the massive application potential of the coating process as an expected high value-added technology, the implementation of the coating process in target material manufacturing has resulted in near-zero research outcomes. As for Cu-In-based nonferrous metals, the scope of research is limited to the properties of Cu-In-based thin films manufactured via PVD and CVD ( Ref 4,7,13). No studies have been carried out to investigate Cu-In based coating manufacture and properties for application as target material using cold spraying.…”
Section: Introductionmentioning
confidence: 99%
“…The precursors not only contain Cu, In and Se, but also some binary compounds, including Cu 11 In 9 , Cu x Se and In 2 Se 3, which were produced in the electrodeposition and annealing process. Different precursors have different reactions and temperature requirements to form CIS, and other reactions lead to a uniform structure [9]. Intensity, a.u.…”
Section: Resultsmentioning
confidence: 99%