Seeman-Bohlin X-ray diffraction study of Al-1 %Si thin films used in ULSI devices

Dapor, Maurizio; Cicolini, G.; Giacomozzi, F.; Boscardin, M.; Queirolo, G.

doi:10.1016/0167-577x(92)90126-5

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“…It depends strongly on residual gas pressure during deposition [22]. Further, the Al thin film texture depends strongly on the energy of the deposited atoms and on the substrate temperature [23]. For sputter-based deposition, the energy of the deposited atoms is influenced by the applied power, the pressure, and it may also depend upon the design of the sputter system [24,25].…”

Section: Introductionmentioning

confidence: 99%