Seebeck measurements of rf sputtered nickel-chromium films

Abstract

Thin films of nickel-chromium alloys (10% chromium) were produced by the radio-frequency (rf) sputtering technique. The Seebeck coefficient of these films was measured with a constant 10 °C differential up to 360 °C versus bulk Alumel wires. At higher sputtering power (400 w) with a water-cooled anode, the seebeck coefficient approached the bulk response to within 2-1/2%. At lower sputtering powers, oxygen was incorporated into the lower density films, causing a decrease in thermal emf. Depositions made at elevated anode temperatures also showed a degradation in thermal emf, probably due to increased film oxidation with temperature.