2003
DOI: 10.1117/12.485434
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Scatterometer-based scanner fingerprinting technique(ScatterLith) and its applications in image field and ACLV analysis

Abstract: The ability to accurately, quickly and automatically fingerprint the lenses of advanced lithography scanners has always been a dream for lithographers. This is truly necessary to understand error sources of ACLV, especially when the optical lithography is pushed into 130 nm regimes and beyond. This dream has become a reality at Texas Instruments with the help of scatterometry.This paper describes the development and characterization of the scatterometer based scanner lens testing technique (ScatterLith) and it… Show more

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Cited by 4 publications
(7 citation statements)
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“…Figure 2b compares typical model results with empirical data, as generated with and in-house lens fingerprinting technique [10], for two reference pitches at three lens positions. The agreement is quite good, especially considering the relative simplicity of the model.…”
Section: Methodsmentioning
confidence: 98%
“…Figure 2b compares typical model results with empirical data, as generated with and in-house lens fingerprinting technique [10], for two reference pitches at three lens positions. The agreement is quite good, especially considering the relative simplicity of the model.…”
Section: Methodsmentioning
confidence: 98%
“…After ScatterLith reduces ACLV to ASLV, the majority of low order CD error contributors are excluded [12]. The remainder is higher order lens aberration and illuminator variation.…”
Section: A New Methodology To Characterize Aclvmentioning
confidence: 99%
“…In this study we demonstrate how much ACLV is attributed to imaging field variation by using Scatterlith step-by-step imaging field correction procedure [12]. In figure 5.1, best focus and ACLV are mapped across 13X5 exposure field locations.…”
Section: Imaging Field Characterizationmentioning
confidence: 99%
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