1999
DOI: 10.1063/1.123614
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Scanning room-temperature photoluminescence in polycrystalline silicon

Abstract: Photoluminescence (PL) mapping was performed on polycrystalline silicon wafers at room temperature. Two PL bands are observed: (1) a band-to-band emission with a maximum at 1.09 eV, and (2) a deep “defect” luminescence at about 0.8 eV. PL mapping of 10 cm×10 cm wafers revealed inhomogeneity of the band-to-band PL intensity which could be correlated to the distribution of minority carrier diffusion length in the wafer bulk. We have also observed that the intensity of the 0.8 eV band is strongest along those gra… Show more

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Cited by 47 publications
(30 citation statements)
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“…3, a spectral analysis of the subbandgap luminescence reveals a broad peak with a maximum at around 1550 nm, indicating a rather broad distribution of energy states with a maximum located at around 0.8 eV away from the conduction or valence band. Similar spectra have previously been published by Tajima, 39 attributing their occurrence to oxygen clusters formed during annealing of Czochralski-grown silicon at around 470°C, and Koshka et al, 35 investigating multicrystalline edge-defined film-fed grown silicon by photoluminescence linking the 0.8 eV defect band to grain boundaries with accumulated impurities, such as oxygen.…”
Section: B Experimental Results and Discussionsupporting
confidence: 68%
See 1 more Smart Citation
“…3, a spectral analysis of the subbandgap luminescence reveals a broad peak with a maximum at around 1550 nm, indicating a rather broad distribution of energy states with a maximum located at around 0.8 eV away from the conduction or valence band. Similar spectra have previously been published by Tajima, 39 attributing their occurrence to oxygen clusters formed during annealing of Czochralski-grown silicon at around 470°C, and Koshka et al, 35 investigating multicrystalline edge-defined film-fed grown silicon by photoluminescence linking the 0.8 eV defect band to grain boundaries with accumulated impurities, such as oxygen.…”
Section: B Experimental Results and Discussionsupporting
confidence: 68%
“…However, not only metal impurities but also oxygen seems to play a major role. Especially, the broad subband-gap luminescence at around 0.8 eV detectable at room temperature in edge-defined filmfed grown silicon 35 as well as in block-cast mc-Si ͑Ref. 36͒ is most likely to be related to thermal donors or oxygen clusters bound to dislocations or trapped in the strain field of dislocations.…”
Section: B Light Emission From Forward-biased P-n Junctionsmentioning
confidence: 99%
“…This stress can lead to the formation of areas with high dislocation density. In these areas, carrier lifetimes are reduced as shown by photoluminescence spectroscopy (PL) [51,52] and transmission electron microscopy (TEM). High stresses can be detected also in areas with a low dislocation density [53].…”
Section: Stress and Dislocationsmentioning
confidence: 99%
“…More recently his work has been extended to the study of intra-grain defects in polycrystalline silicon for photovoltaic applications [3]. S. Ostapenko et al at University of Florida have also published very fundamental results on PL mapping of carrier lifetime in relation with recombination centres in multicrystalline silicon [4]. Many results published since 2000 in the field of photovoltaics are due to T. Trupke et al at University of New South Wales [5][6][7].…”
Section: Introductionmentioning
confidence: 95%