Scalable Graphene Electro-Patterning, Functionalization, and Printing

Abstract

Scalable direct graphene patterning and functionalization approaches, which are essential to harness the excellent physical properties of graphene for various biological, chemical, electronic, and optical device applications, are demonstrated in this study. These are achieved by employing simple scalable affordable electrochemical methods. First, graphene was patterned and functionalized in multiple concentric ring shapes and this is realized by controlling the liquid droplet size and the polarity of the applied bias voltage, respectively. Second, the pattern transfer from a mask to graphene is also conducted with assistance of a photoresist (PR) pattern on graphene. The unprotected graphene by the PR was etched by the electrochemical process. Finally, the direct pattern writing on graphene is demonstrated by dragging a liquid droplet at a bias voltage. This maskless direct patterning process of graphene can be extended to a large scale graphene patterning by employing a computerized xyz translation stage like an inkjet printer.

Interface Chemistry of Graphene/Cu Grafted By 3,4,5-Tri-Methoxyphenyl

“…This finding demonstrates that high quality grafting can be achieved in a set-up with growth conditions less demanding with respect to UHV-related methods 36 , therefore disclosing the possibility to apply photoemission techniques to systems prepared on the basis of similar electrochemical methods 37 , and ultimately enabling a scalable pathway for the production of functionalized graphene layers.…”

High Responsivity and Detectivity Graphene-Silicon Majority Carrier Tunneling Photodiodes with a Thin Native Oxide Layer

“…A graphene layer was synthesized on a polished copper (Cu) foil (∼100 μm in thickness) using a conventional chemical vapor deposition (CVD) growth method. − The Cu foil (area of 7 mm × 7 mm) was etched by Fe 2 Cl 3 etchant solution after deposition a poly methyl methacrylate (PMMA) layer on the grown graphene/Cu layer. The residue of Fe 2 Cl 3 etchant was rinsed by deionized (DI) water in several times. , …”

“…The residue of Fe 2 Cl 3 etchant was rinsed by deionized (DI) water in several times. 20,21 The patterned aluminum (Al) electrodes (2 mm × 5 mm) were deposited on a 300 nm thick SiO 2 /Si (p-type) substrate by a DC magnetron sputtering method. The Ohmic back contact to the Si substrate was achieved by deposition of gold (Au) on the back side of the etched Si.…”

Magnetic Fabry-Pérot interferometer for valley filtering in a honeycomb-dice model

“…x > L/2 (B1) where k x = (k y − k 0 ) 2 − E 2 , q x = (k y + k 0 ) 2 − E 2 , X = 2 γ (k y + γx) and p χ is given by Eq. (15). The continuity of the function ψ B (x) and its derivative at x = ±L/2 leads to a system of four equations for each valley: 5T .…”

“…The black phosphorus has also been used as valley filter with the merging of Dirac cones 14 . As well, the presence of a magnetic field and a potential barrier in bilayer graphene acts as a valley filter 15 .…”