Routes of metal oxide formation from metal β-diketonates used as CVD precursors

Turgambaeva, Asiya E.; Krisyuk, Vladislav V.; Bykov, A.; Игуменов, И. К.

doi:10.1051/jp4:1999808

Cited by 15 publications

(19 citation statements)

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“…On the other hand, at higher temperatures, the DSC analysis shows only a sharp exothermic peak at 286 C, which could be related to an oxidative decomposition. In this case, MS data show ion current peak intensities, not only due to fragments at 15,18,41,44 [49±51] As already observed in other mass spectrometric/thermal decomposition studies of various b-diketonates, [50,51] mass at m/z=111 (C(CH 3 ) 3 -…”

Section: Ex-situ Studiesmentioning

confidence: 74%

Comparison of Thermal and Mass-Transport Properties of Bi(tmhd)3, Bi(p-tol)3, and Bi(o-tol)3 MOCVD Precursors

Bedoya

Condorelli

Finocchiaro

et al. 2005

Chem. Vap. Deposition

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Metal-organic (MO)CVD processes using three different precursors (Bi(tmhd) 3 , 3 , and Bi(o-tol) 3 ) have been investigated. Combined, thermal, and mass spectroscopic investigations have provided information on their thermal robustness during sublimation processes. In-situ Fourier-transform infrared (FTIR) measurements have allowed the monitoring of masstransported precursors during MOCVD experiments. Temperature windows of 190±277 C, 170±270 C, and 150±220 C have proved suitable for the efficient vaporization of Bi(tmhd) 3 , Bi(p-tol) 3 , and Bi(o-tol) 3 , respectively, even though aryl precursors have proved to be more stable than b-diketonate during the sublimation and transport processes.Above 350 C, decomposition during the MOCVD processes has been observed for all the precursors. In the case of Bi(tmhd) 3 and Bi(o-tol) 3 it involves the ligand fragmentation, while for Bi(p-tol) 3 , dissociation of the intact aryl ring seems to occur.

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Section: Ex-situ Studiesmentioning

confidence: 74%

Comparison of Thermal and Mass-Transport Properties of Bi(tmhd)3, Bi(p-tol)3, and Bi(o-tol)3 MOCVD Precursors

Bedoya

Condorelli

Finocchiaro

et al. 2005

Chem. Vap. Deposition

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“…Data on the thermal stability of the compound vapor and decomposition products under molecular flow conditions were obtained, making use of a modified method of high-temperature mass spectrometry designed and successfully used by us [10,11,14]. Thermolysis of Ti(dpm) 2 (O i Pr) 2 vapors was investigated at 130±500 C, in vacuo and in the presence of O 2 .…”

Section: Methodsmentioning

confidence: 99%

“…It may also offer a scheme, and possibly even the mechanism, of thermolysis on the heated surface in the ªisolated moleculeº approximation. [10,11] 2. Results and Discussion 2.1.…”

Section: Introductionmentioning

confidence: 99%

Thermal Behavior of Ti(dpm)2(OiPr)2 Vapors

Turgambaeva¹,

Krisyuk

Сысоев

et al. 2001

Chem. Vap. Deposition

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A study of the thermal behavior of Ti(dpm) 2 (O i Pr) 2 , used as a source compound to obtain TiO 2 films, was carried out. Ti(dpm) 2 (O i Pr) 2 was synthesized by an original technique. Data on vapor pressure and composition, thermal stability, and decomposition products of the compound were obtained, both in vacuo and in the presence of oxygen. A mechanism is suggested for the thermal decomposition of a vapor on a hot surface.

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“…Mechanism of decomposition of the investigated complex on heated surface. decomposition product for non-fluorinated metal b-diketonates, and in particular for copper(II) complexes [22,23]. Gaseous products of decomposition in a vacuum are similar to those formed in the presence of hydrogen.…”

Section: Thermal Decomposition Of Cu(tmha) 2 Vapoursmentioning

confidence: 93%

“…Such a qualitative approach provides the possibility of estimating the composition of the vapor of the initial complex and its vaporization stability and of predicting the composition of the solid phase in the decomposition of vapors on the surface [22,23].…”

Section: Introductionmentioning

confidence: 99%