Phase transition and coexistence of 2H (trigonal prismatic structure) and 1T′ (distorted octahedral structure) phases occur easily in molybdenum ditelluride (MoTe 2 ) when compared with other 2D MX 2 type (M = Mo, W and X = S, Se) transition metal dichalcogenides (TMDs) because of small discrepancies in the cohesive energy. [1][2][3][4] Phase-engineered 2D TMDs, particularly MoTe 2 films including 2H, 1T′, and 1T phases, are very attractive candidates for numerous electronic applications, such as ambipolar field-effect transistors (FETs), environmental sensors, superconductors, spintronics, and valley optoelectronics. [5][6][7][8] Atomically thin-layer 2H MoTe 2 possesses a narrow bandgap energy of 1 eV in comparison to the bandgap energy (1.89 eV) of monolayer MoS 2 and is a potential candidate for various optoelectronic device applications, such as solar cells and photodetectors. [3,8,9] From the electronic device application point of view, the 2H and the 1T phases, i.e., semiconducting and semimetal MoTe 2 are applicable as a 2D materials beyond molybdenum disulfide such as molybdenum ditelluride (MoTe 2 ) have attracted increasing attention because of their distinctive properties, such as phase-engineered, relatively narrow direct bandgap of 1.0-1.1 eV and superior carrier transport. However, a wafer-scale synthesis process is required for achieving practical applications in next-generation electronic devices using MoTe 2 thin films. Herein, the direct growth of atomically thin 1T′, 1T′-2H mixed, and 2H phases MoTe 2 films on a 4 in. SiO 2 /Si wafer with high spatial uniformity (≈96%) via metal-organic vapor phase deposition is reported. Furthermore, the wafer-scale phase engineering of few-layer MoTe 2 film is investigated by controlling the H 2 molar flow rate. While the use of a low H 2 molar flow rate results in 1T′ and 1T′-2H mixed phase MoTe 2 films, 2H phase MoTe 2 films are obtained at a high H 2 molar flow rate. Field-effect transistors fabricated with the prepared 2H and 1T′ phases MoTe 2 channels reveal p-type semiconductor and semimetal properties, respectively. This