2003
DOI: 10.1109/led.2003.811405
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Role of front contact work function on amorphous silicon/crystalline silicon heterojunction solar cell performance

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Cited by 119 publications
(60 citation statements)
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“…The change in Al work function to −3.3 eV is approximately the same as that reported by Toyoshima et al [9]. The work function of ITO can vary from −4.3 to −5.1 depending on the stoichiometry, organic contamination and oxidation type [15], and we have assumed it to be shifting to about −5.0 eV and this explains our experimental behavior. Further, approximate changes in HOMO-LUMO levels in the active material have been shown in figure 2(c).…”
Section: Resultssupporting
confidence: 87%
“…The change in Al work function to −3.3 eV is approximately the same as that reported by Toyoshima et al [9]. The work function of ITO can vary from −4.3 to −5.1 depending on the stoichiometry, organic contamination and oxidation type [15], and we have assumed it to be shifting to about −5.0 eV and this explains our experimental behavior. Further, approximate changes in HOMO-LUMO levels in the active material have been shown in figure 2(c).…”
Section: Resultssupporting
confidence: 87%
“…Only from a passivation perspective, the presence of a highly doped (n-type) TCO can be beneficial when capping in stacks, but is detrimental for ip stacks. These two opposite observations are coherent with a reduced and augmented, TCO/a-Si:H(n/p) WF mismatch, respectively [39], as result of TCO doping and bare TCO WF variations (for a more detailed discussion on the factors determining energy-band lineup and band bending in the c-Si wafer; see also the Appendix). These phenomena may directly impact the FF upper limits, for the different SHJ device architectures (see Section IV).…”
Section: ) Low-pressure Chemical Vapor Deposition Boron-doped Zinc Omentioning
confidence: 61%
“…An open question, and a potential challenge in implementing new TCOs in SHJ cells, is how the alignment of the TCO band structure with that of the doped a-Si:H layers underneath affects carrier transport [113]. As practically all available TCOs are n-type, an Ohmic contact with n-type a-Si:H can be assured.…”
Section: Transparent Conductive Oxide Depositionmentioning
confidence: 99%