2020 ACM/IEEE 47th Annual International Symposium on Computer Architecture (ISCA) 2020
DOI: 10.1109/isca45697.2020.00059
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Revisiting RowHammer: An Experimental Analysis of Modern DRAM Devices and Mitigation Techniques

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Cited by 98 publications
(199 citation statements)
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“…In all cases, the ever-shrinking SN capacitance amplifies the disturb whatever mechanism is looked at since each electron reaching a charged node has an effect on the node's potential that is inversely proportional to the node's capacitance. Indeed, the quite dramatic reduction in hammer count seen in newer DRAM generations [6] can mostly be attributed to the SN capacitance reducing at a rate of about 3 fF per node [24]. We can also predict the existence of susceptible cells within a technology node as those with one or more of the following characteristics: a cell that contains an SN capacitance whose value is in the lower end of the distribution; a cell with a transistor whose threshold voltage is in the lower end of distribution; a cell that is physically far away from where the victim wordline is held at ground; a cell close to a particularly egregious electron emitter.…”
Section: Discussionmentioning
confidence: 99%
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“…In all cases, the ever-shrinking SN capacitance amplifies the disturb whatever mechanism is looked at since each electron reaching a charged node has an effect on the node's potential that is inversely proportional to the node's capacitance. Indeed, the quite dramatic reduction in hammer count seen in newer DRAM generations [6] can mostly be attributed to the SN capacitance reducing at a rate of about 3 fF per node [24]. We can also predict the existence of susceptible cells within a technology node as those with one or more of the following characteristics: a cell that contains an SN capacitance whose value is in the lower end of the distribution; a cell with a transistor whose threshold voltage is in the lower end of distribution; a cell that is physically far away from where the victim wordline is held at ground; a cell close to a particularly egregious electron emitter.…”
Section: Discussionmentioning
confidence: 99%
“…Other relevant full-chip experimental data include the effect of temperature [3], [27], [16] where RH susceptibility has been seen to be the worst within the range of 13 • C to 30 • C [27] although the effect was not as pronounced in [16]. Also, more advanced DRAM technologies suffer more from this disturb in having greater numbers of bit-flips per aggressor wordline activation [3], [6], [8] and a lower hammer count needed to flip the first bit [6].…”
Section: Experimental Data At Chip Levelmentioning
confidence: 99%
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“…To prevent the row-hammering attack, some works [32] increases refresh rate, significantly degrading the system performance. Please, note that as mentioned in [33], the rowhammering can be predictable by observing the number of accessing of adjacent rows. Recently, [33], [34] proposed the algorithms that can predict the location of row-hammering.…”
Section: F Row-hammering Preventionmentioning
confidence: 99%