Residual stresses in PVD hard coatings

Oettel, H.; Wiedemann, Renate

doi:10.1016/0257-8972(95)02581-2

Cited by 180 publications

(50 citation statements)

References 26 publications

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“…The different nature of failures observed in the inverted images of craters developed in the course of erosion resistance test results probably from differences of the residual stresses in particular coat- ings. The residual stresses occurring in coatings are composed of the stress developed due to coating growth and from the thermal stress resulting from the difference of the thermal expansion coefficients of substrate and coating [24][25][26][27]. One can judge that in case of the Ti + TiN coatings, reduction of stresses occurs along with the deposition temperature rise, which is demonstrated by lowering of erosion resistance of coatings obtained at elevated temperatures.…”

Section: Discussion Of the Investigation Resultsmentioning

confidence: 97%

Ti+TiN, Ti+Ti(CxN1−x), Ti+TiC PVD coatings on the ASP 30 sintered high-speed steel

Kwaśny

Dobrzański

Bugliosi³

2004

Journal of Materials Processing Technology

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Section: Discussion Of the Investigation Resultsmentioning

confidence: 97%

Ti+TiN, Ti+Ti(CxN1−x), Ti+TiC PVD coatings on the ASP 30 sintered high-speed steel

Kwaśny

Dobrzański

Bugliosi³

2004

Journal of Materials Processing Technology

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“…In conventional magnetron sputtering, a negative substrate bias voltage is usually applied to improve the structure densification of the deposited coatings, which however inevitably results in high residual compressive stresses in the coatings, e.g. as being measured in this study and shown in literature [24,42,[51][52][53] . Such residual stresses are known to be deteriorating to the adhesion property of hard coatings, especially for those to be used under severe tribological loading conditions.…”

Section: Effect Of Hipims On Coating Structurementioning

confidence: 96%

Hybrid HIPIMS and DC magnetron sputtering deposition of TiN coatings: Deposition rate, structure and tribological properties

Luo

Yang

Cooke

2013

Surface and Coatings Technology

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Abstract:High power impulse magnetron sputtering (HIPIMS) has the advantage of ultra-dense plasma deposition environment although the resultant deposition rate is significantly low. By using a closed field unbalanced magnetron sputtering system, a hybrid process consisting of one HIPIMS powered magnetron and three DC magnetrons has been introduced in the reactive sputtering deposition of a TiN hard coating on a hardened steel substrate, to investigate the effect of HIPIMS incorporation on the deposition rate and on the microstructure and mechanical and tribological properties of the deposited coating. Various characterizations and tests have been applied in the study, including XRD, FEG-SEM, cross-sectional TEM, Knoop hardness, adhesion tests and unlubricated ball-on-disk tribo-tests. The results revealed that, both the DC magnetron and hybrid-sputtered TiN coatings exhibited dense columnar morphology, a single NaCl-type cubic crystalline phase with strong (220) texture, and good adhesion property. The two coatings showed similar dry sliding friction coefficient of 0.8 -0.9 and comparable wear coefficient in the range of 1 -2 × 10 -15 m 3 N -1 m -1 . The overall deposition rate of the hybrid sputtering, being 0.047 µm/min as measured in this study, was governed predominantly by the three DC magnetrons whereas the HIPIMS only made a marginal contribution. However, the incorporated HIPIMS has been found to lead to remarkable reduction of the compressive residual stress from -6.0 to -3.5 GPa and a slight increase in the coating hardness from 34.8 to 38.0 GPa.

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“…[62,65] Increased diffusivities during film annealing commonly lead to defect annihilation and atomic re-arrangement resulting in lower stresses. [68,83] Since structural defects act as obstacles for dislocation motion, a direct relationship between defect density and hardness is expected. [68] Thus, lattice parameter, diffraction peak widths, and consequently the hardness of stoichiometric binary nitride and carbide layers typically decreases during annealing.…”

Section: Two-dimensional Nanostructure Of Tib 24mentioning

confidence: 99%

Self‐Organized Nanostructures in Hard Ceramic Coatings

2005

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Nanostructures have attracted increasing interest in modern development of hard coatings for wear‐resistant applications. In plasma‐assisted vapor deposited thin films, nanostructures can evolve during growth or a post‐deposition annealing treatment. In this review we demonstrate, using TiB2.4, TiN–TiB2, Ti0.34Al0.66N, and Ti(N,B) as model‐coatings, the development of nanostructures and its influence on the mechanical properties of ceramic thin films. For TiB2.4 and TiN–TiB2 a two‐dimensional and three‐dimensional nanostructure, respectively, organizes itself during growth by segregation driven processes. Growth of Ti0.34Al0.66N and Ti(N,B) results in the formation of a supersaturated TiN based phase, which tends to decompose into its stable constituents during post‐deposition annealing via the formation of nm‐sized domains. As the hardness of a material is determined by resistance to bond distortion and dislocation formation and motion, which depend on the amount and constitution of obstacles provided, there is a direct relation between hardness and nanostructure.

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Residual stresses in PVD hard coatings

Cited by 180 publications

References 26 publications

Ti+TiN, Ti+Ti(CxN1−x), Ti+TiC PVD coatings on the ASP 30 sintered high-speed steel

Ti+TiN, Ti+Ti(CxN1−x), Ti+TiC PVD coatings on the ASP 30 sintered high-speed steel

Hybrid HIPIMS and DC magnetron sputtering deposition of TiN coatings: Deposition rate, structure and tribological properties

Self‐Organized Nanostructures in Hard Ceramic Coatings

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