Relationship of chemical and structural properties with the tribological behavior of sputtered SiCN films

Hoche, Holger; Allebrandt, Daniel; Bruns, Michael; Riedel, Ralf; Fasel, Claudia

doi:10.1016/j.surfcoat.2008.06.126

Cited by 39 publications

(37 citation statements)

References 30 publications

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“…The SiCN hard films show a surprising low friction coefficient of 0.2 when the silicon content is relatively low. SiCN films have been produced by means of reactive magnetron sputtering of a silicon target in an argon/nitrogen/acetylene atmosphere (Hoche et al, 2008). The mechanical, chemical, and structural properties have been thoroughly investigated by means of indentation hardness testing, pin on disk wear testing in reciprocating sliding motion, glow discharge optical emission spectroscopy (GDOES), FTIR, Raman spectroscopy, XPS.…”

Section: Silicon Carbonitride Compoundsmentioning

confidence: 99%

Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films

Hoffmann¹,

Файнер²,

Косинова³

et al. 2011

Silicon Carbide - Materials, Processing and Applications in Electronic Devices

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Section: Silicon Carbonitride Compoundsmentioning

confidence: 99%

Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films

Hoffmann¹,

Файнер²,

Косинова³

et al. 2011

Silicon Carbide - Materials, Processing and Applications in Electronic Devices

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“…Although the SiC thin films and their doped modifications are very promising materials in many structural applications and their mechanical properties have been studied thoroughly [55][56][57], there is a lack of systematic information about their deformation response to the scratch loading and adhesion strength. The tribological properties of various types of SiC x N y films and coatings have been studied and compared [57][58][59][60][61].…”

Section: Introductionmentioning

confidence: 99%

“…The tribological properties of various types of SiC x N y films and coatings have been studied and compared [57][58][59][60][61]. However, in most cases the deformation mechanism or the failure dynamic were neglected.…”

Section: Introductionmentioning

confidence: 99%

On the Importance of Combined Scratch/Acoustic Emission Test Evaluation: SiC and SiCN Thin Films Case Study

et al. 2018

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Abstract:The scratch test, as probably the most widespread technique for assessment of the adhesive/cohesive properties of a film-substrate system, fully depends on reliable evaluation based on assessment of critical loads for systems' failures. Traditionally used evaluation methods (depth change record and visual observation) may sometimes give misleading conclusions about the failure dynamics, especially in the case of opaque films. Therefore, there is a need for another independent evaluation technique with the potential to complete the existing approaches. The nondestructive method of acoustic emission, which detects the elastic waves emitted during film cracking and delamination, can be regarded as a convenient candidate for such a role even at nano/micro scale. The strength of the combination of microscopic observation of the residual groove and depth change record with the acoustic emission detection system proved to be a robust and reliable approach in analyzing adhesion/cohesion properties of thin films. The dynamics of the gradual damage taking place during the nano/micro scratch test revealed by the combined approach is presented for SiC and SiCN thin films. Comparison of critical load values clearly reflects the higher ability of the AE approach in detecting the initial material failure compared to the visual observation.

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“…4 Thus, coatings for cutting tools retaining combined hard and lubricating properties at high temperatures seem to be very interesting alternatives to reduce the enormous amounts of cooling emulsion and to work with minimal or no lubricant in a number of applications. 4,5 Moreover, energy generation related issues also demand coating for high temperatures applications, especially with high oxidation and corrosion resistance. For instance, to accomplish the next generation of coal power plants combustion engines in integrated gasification combined-cycle with 50% efficiency and zero emissions, they must operate at temperatures as high as 1400°C.…”

Section: Introductionmentioning

confidence: 99%

Physicochemical, structural, and mechanical properties of Si3N4 films annealed in O2

Aguzzoli

Marin

Figueroa

et al. 2010

Journal of Applied Physics

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The physicochemical, structural, and mechanical properties of silicon nitride films deposited by radio frequency reactive magnetron sputtering were investigated before and after thermal annealing in 18 O 2 . As-deposited films were essentially amorphous, stoichiometric, and free from contaminants for a wide range of deposition parameters, with hardness figures ranging from 16.5-22 GPa, depending mainly on the deposition temperature. After 18 O 2 annealing at 1000°C, films hardness converged to 21 GPa, independently of the deposition temperature, which is explained based on the crystallization of the films at this annealing temperature. Moreover, oxygen is incorporated only in 7.5 nm of the Si 3 N 4 , forming silicon oxynitride at the top surface of the film, indicating a good oxidation resistance at high temperature. Finally, the elastic strain to failure ͑H 3 / E 2 ͒, which mimics the wear resistance of the film, doubles after the 1000°C annealing. These observations show the great potential of silicon nitride as a hard coating for high temperature applications.

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Relationship of chemical and structural properties with the tribological behavior of sputtered SiCN films

Cited by 39 publications

References 30 publications

Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films

Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films

On the Importance of Combined Scratch/Acoustic Emission Test Evaluation: SiC and SiCN Thin Films Case Study

Physicochemical, structural, and mechanical properties of Si3N4 films annealed in O2

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