2016
DOI: 10.1109/jetcas.2016.2547718
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Recent Progress in Phase-ChangeMemory Technology

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Cited by 315 publications
(203 citation statements)
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References 87 publications
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“…The sensing margin of AST based cell is ~2 orders of magnitude (Reset resistance ~10 5 Ω, Set resistance ~10 3 Ω), equal to that of AST based cells (Reset resistance ~10 4 Ω, Set resistance ~10 2 Ω). High resistance of AST based cell in Set state is regarded as a benefit of lowering the driven current, improving the Joule heat efficiency 32 . Furthermore, the Set speed has been significantly improved after Al doping, for a Set operation has been achieved by 6 ns pulse in AST based cell, while it should be ~20 ns in ST based cell.…”
Section: Resultsmentioning
confidence: 99%
“…The sensing margin of AST based cell is ~2 orders of magnitude (Reset resistance ~10 5 Ω, Set resistance ~10 3 Ω), equal to that of AST based cells (Reset resistance ~10 4 Ω, Set resistance ~10 2 Ω). High resistance of AST based cell in Set state is regarded as a benefit of lowering the driven current, improving the Joule heat efficiency 32 . Furthermore, the Set speed has been significantly improved after Al doping, for a Set operation has been achieved by 6 ns pulse in AST based cell, while it should be ~20 ns in ST based cell.…”
Section: Resultsmentioning
confidence: 99%
“…[81] Another issue with PCM is the conductance drift, or relaxation, which is frequently observed especially for the amorphous state (i.e., off-state). [136] The drift coefficient v and time constant t 0 are material system dependent. [136] The drift coefficient v and time constant t 0 are material system dependent.…”
Section: Artificial Synapsesmentioning
confidence: 99%
“…[135] This phenomenon leads to a slow but steady increase in the device resistance over time, which follows the equation R(t) = R 0 (t/t 0 ) v , where R 0 represents the initial programmed resistance and t is the time elapsed since programming. [136] In PCM fabrication, the drift coefficient can be largely reduced using a metallic surfactant liner as a resistance drift stabilizer. A typical v is ≈0.1, while t 0 shows a large variation.…”
Section: Artificial Synapsesmentioning
confidence: 99%
“…It can be switched from an amorphous high resistive phase to a crystalline low resistive phase by applying a short voltage pulse [1], [2]. This technology is overcoming all of its potential roadblocks and now exhibits rapid switching, extended endurance, high temperature data retention, low power consumption, and good thermal stability under solder reflow conditions [3]- [5].…”
Section: Introductionmentioning
confidence: 99%