2019
DOI: 10.1002/admt.201900108
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Recent Progress in 2D Layered III–VI Semiconductors and their Heterostructures for Optoelectronic Device Applications

Abstract: During the past decade, great effort has been devoted to research on 2D layered materials due to their reduced thickness and extraordinary physical properties, which open new opportunities for developing next‐generation applications in various fields. Ultrathin III–VI semiconductors (e.g., GaSe, InSe, In2Se3, etc.) have emerged as potential candidates for nano‐optoelectronic applications thanks to their sizable layer‐dependent bandgaps and high carrier mobility, which could enable broadband photodetection and … Show more

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Cited by 118 publications
(57 citation statements)
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“…These calculations revealed how the bandgap of InI could be engineered, which is highly desirable in electronics and optoelectronics device applications. [ 32,33 ]…”
Section: Resultsmentioning
confidence: 99%
“…These calculations revealed how the bandgap of InI could be engineered, which is highly desirable in electronics and optoelectronics device applications. [ 32,33 ]…”
Section: Resultsmentioning
confidence: 99%
“…Layered two-dimensional (2D) group III metal chalcogenides (MCs) (GaSe, GaTe, InSe, and others) are still of strong interest for the development of novel high-performance semiconductor devices due to their unique electronic and optical properties [ 1 , 2 , 3 ]. In particular, these materials have attracted great attention for the fabrication of field-effect transistors [ 4 ], solar cells [ 5 , 6 ], high-efficient photodetectors, and gas sensing devices [ 7 , 8 ]. InSe has significant potential for using in thermoelectric applications [ 9 ].…”
Section: Introductionmentioning
confidence: 99%
“…), are also expected to be coupled with optical architectures for device performance improvement. 48,163 dimensional layered materials and devices, organic semiconductors, nanomaterials and nanoscopic characterization, and high thermal conductive materials. He is a Fellow of IEEE and HKIE, and recipient of Vice-Chancellor's Outstanding Fellow of Engineering, CUHK.…”
Section: Discussionmentioning
confidence: 99%