Ferroelectric field-effect transistor (FeFET) has become a center of attraction for non-volatile memory application because of their low power, fast switching speed, and high scalability. In this work, we show an nchannel FeFET-based Multibit memory, termed "MirrorBit", which effectively doubles the chip density via programming the gradient ferroelectric polarizations in the gate, using an appropriate biasing scheme. A TCAD simulation of the MirrorBit operation is presented, based on the FeFET model calibrated using the GlobalFoundries HfO2-based FeFET device fabricated at 28 nm bulk HKMG CMOS technology. The simulation results reveal that the MirrorBit has uniform and non-uniform (gradient) polarization variations in the ferroelectric layer from source to drain, consisting of a total of 4 states. The spatially programmed polarization can be distinguished based on its effect on channel current in two different read directions, namely, source read and drain read. The threshold voltages, V T , are symmetric for uniform polarization bit and asymmetric when MirrorBit is programmed for source and drain reads. Thus, we have converted 1-bit FeFET into 2-bit FeFET using programming and reading schemes in existing FeFET, without the need for any special fabrication process, to double the chip density for high-density non-volatile memory storage.