2009 IEEE International Electron Devices Meeting (IEDM) 2009
DOI: 10.1109/iedm.2009.5424385
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Read/write operation of spin-based MOSFET using highly spin-polarized ferromagnet/MgO tunnel barrier for reconfigurable logic devices

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Cited by 20 publications
(21 citation statements)
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“…The introduction of a tunnel barriers to boost the spin injection efficiency and magnetoresistance ration for parallel/anti-parallel source/drain magnetization orientation reduces the on-current. However, the magnetoresistance ratio of 10% demonstrated at 12K for a 10µm long silicon [132] channel is not sufficient for applications. It is far inferior to the magnetoresistance ratio in magnetic tunnel junctions, where the two ferromagnetic metals are separated by a thin tunnel barrier.…”
Section: Tunnel Barriers and Magnetoresistance At Elevated Temperaturementioning
confidence: 91%
“…The introduction of a tunnel barriers to boost the spin injection efficiency and magnetoresistance ration for parallel/anti-parallel source/drain magnetization orientation reduces the on-current. However, the magnetoresistance ratio of 10% demonstrated at 12K for a 10µm long silicon [132] channel is not sufficient for applications. It is far inferior to the magnetoresistance ratio in magnetic tunnel junctions, where the two ferromagnetic metals are separated by a thin tunnel barrier.…”
Section: Tunnel Barriers and Magnetoresistance At Elevated Temperaturementioning
confidence: 91%
“…Much lower values for L sf , up to 300 nm, were obtained in lateral devices with diffusive injection for highly doped silicon [10]. Local measurement of spin polarized current injected and detected from ferromagnetic clusters separated in average by 50nm on low doped silicon was performed by our group with polarization up to 1% [11,12] and values up to 12% were achieved by Marukame and co-authors [13] 14]. Precisely one of the points in this paper is to discuss the value of formula (1).…”
mentioning
confidence: 93%
“…Ferromagnetic materials provide stable and robust nonvolatile memory [2]. Fig.1(a) shows a spin MOSFET in which the write process is carried out by using magnetic tunneling junction (MTJ) [3,4]. Spin MOSFET directly couples logic element with nonvolatile memory element, opening up a path to a new style of logic-in-memory architecture [5].…”
Section: Introductionmentioning
confidence: 99%