1967
DOI: 10.1063/1.1754909
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Reactively Sputtered Vanadium Dioxide Thin Films

Abstract: Thin films of vanadium dioxide have been formed by reactive sputtering of vanadium in an argon atmosphere doped with a partial pressure of oxygen. The films were deposited on sapphire substrates held at 400°C and exhibit a highly oriented polycrystalline monoclinic structure at room temperature. The semiconductor to metal transition is observed at 345°K with a slight hysteresis with temperature reversal.

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Cited by 62 publications
(21 citation statements)
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“…The switching takes place due to a semiconductor to metal (MIT) transition that is accompanied by a first order structural phase transition from monoclinic to rutile. As a consequence, a drop in the resistance of around four orders of magnitude is observed [5], along with a remarkable decrease of the IR transmittance [6]. The origin of the MIT transition still remains controversial.…”
Section: Introductionmentioning
confidence: 99%
“…The switching takes place due to a semiconductor to metal (MIT) transition that is accompanied by a first order structural phase transition from monoclinic to rutile. As a consequence, a drop in the resistance of around four orders of magnitude is observed [5], along with a remarkable decrease of the IR transmittance [6]. The origin of the MIT transition still remains controversial.…”
Section: Introductionmentioning
confidence: 99%
“…VO 2 synthesis is usually a complicated process due to the narrow temperature-pressure window and optimization of various parameters. That is mainly due to the multiple valence states of vanadium [41]. Due to the small compositional differences between the numerous phases of vanadium oxide, hence VO 2 preparation requires a stringently controlled process that provides the desired oxygen stoichiometry and correct crystalline structure.…”
Section: Theoretical Backgroundmentioning
confidence: 99%
“…Reactive sputtering of a metal in an inert gas, with a small amount of an active gas present, has been used extensively as a technique for forming metallic compounds, for example, transition metal compounds of V, Nb, Ta, Mo and W, which are otherwise difficult to achieve. V0 2 thin films were first grown by reactive sputtering in Fuls et al [85], who synthesised the films by reactive ion-beam sputtering of a vanadium target in an argon-oxygen atmosphere. Therefore, the gaseous vanadium reacts with the oxygen gas in the deposition chamber to form a V0 2 thin film by condensing onto a substrate.…”
Section: Physical Vapour Depositionmentioning
confidence: 99%