Understanding
the etching mechanisms of MXene and obtaining direct
insights into the influence of etchants on structural features and
defects are of critical importance for improving MXene properties,
optimization of etching protocols, and exploring new MXene compositions.
Despite their importance, such studies have been challenging because
of the monoatomic thickness of the A-element layers being etched and
aggressive etchants that hinder in situ studies. Here, we visualize
the etching behavior of the Ti3AlC2 MAX phase
in different etchants at the atomic scale using focused ion beam and
electron microscopy. We also report on the structural changes in the
Ti3AlC2 phase as a function of etching time
and etchant type (LiF/HCl, HF, or NH4HF2) to
reveal the etching mechanism for the first time. Interestingly, direct
visualization reveals an unexpected stepwise etching where the edge
Al atoms at the middle layers of the MAX particle are not etched despite
contact with the acidic etchant counterintuitively. Also, while the
propagation of the etching front occurs in the direction normal to
the inner basal plane for all etchants, we reveal that HF and NH4HF2 etch the grain boundaries of polycrystal MAX
particles to expose more edge sites to the etchant, which is not observed
for LiF/HCl.