Reactive sputtering of magnesium oxide thin film for plasma display panel applications

Choi, Young Wook; Kim, J.H.

doi:10.1016/j.tsf.2004.01.066

Cited by 20 publications

(9 citation statements)

References 6 publications

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“…20 The choice of MgO as a starting material is based on the large amount of data on the growth mechanism of the MgO film deposited by reactive magnetron sputtering. [25][26][27][28][29] This material has been used as a buffer layer in the production of so-called coated conductors, where the conducting material is a high temperature superconductor. MgO is also studied for its high electron emission yield for plasma display panels.…”

Section: Introductionmentioning

confidence: 99%

Compositional effects on the growth of Mg(M)O films

Saraiva

Georgieva

Mahieu

et al. 2010

Journal of Applied Physics

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The influence of the composition on the crystallographic properties of deposited Mg(M)O (with M=Al, Cr, Ti, Y, and Zr) films is studied. For a flexible control of the composition, dual reactive magnetron sputtering was used as deposition technique. Two different approaches to predict the composition are discussed. The first is an experimental way based on the simple relationship between the deposition rate and the target-substrate distance. The second is a route using a Monte Carlo based particle trajectory code. Both methods require a minimal experimental input and enable the user to quickly predict the composition of complex thin films. Good control and flexibility allow us to study the compositional effects on the growth of Mg(M)O films. Pure MgO thin films were grown with a (111) preferential out-of-plane orientation. When adding M to MgO, two trends were noticed. The first trend is a change in the MgO lattice parameters compared to pure MgO. The second tendency is a decrease in the crystallinity of the MgO phase. The experimentally determined crystallographic properties are shown to be in correspondence with the predicted properties from molecular dynamics simulations

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Section: Introductionmentioning

confidence: 99%

Compositional effects on the growth of Mg(M)O films

Saraiva

Georgieva

Mahieu

et al. 2010

Journal of Applied Physics

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“…Such properties allow using this compound as a dielectric material to replace silicon dioxide in some applications [2]. MgO can also be used as a protective layer of plasma display panels to extend the service life of such panels through high durability and improved discharge characteristics [4][5][6]. Magnetic tunnel junctions (MTJ), where MgO is used as a barrier layer, are of great importance not only for the creation of microelectronic and spintronic devices but also to clarify the mechanisms of spin-dependent tunneling of electrons [7].…”

Section: Introductionmentioning

confidence: 99%

“…MgO thin films can be obtained using the following methods: metalorganic molecular beam epitaxy [10], metalorganic chemical vapor deposition [11], pulsed laser * corresponding author; e-mail: alexey.dyachenko@ukr.net deposition [12], reactive sputtering [5], chemical vapor deposition [13], sol-gel synthesis [14], spray pyrolysis [15], etc. Because of its simplicity, low cost, high-speed deposition and the possibility of obtaining films on large area substrates using various precursors, the spray pyrolysis is an effective non-vacuum method for obtaining high-quality thin films of oxides.…”

Section: Introductionmentioning

confidence: 99%

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Surface Morphology, Structural and Optical Properties of MgO Films Obtained by Spray Pyrolysis Technique

et al. 2016

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X-ray diffraction, atomic force microscopy, field emission scanning electron microscopy, UV-visible photometry, and photoluminescence measurements were used to investigate the surface morphology and structural and optical properties of MgO films. Magnesium oxide films deposited by the spray pyrolysis technique were studied. The substrate temperature was varied from Ts = 643 K to 693 K. Magnesium chloride hexahydrate (MgCl2 ·6H2O), dissolved in deionized water, was used as the precursor solution. It was established that the single phase films crystallize into a cubic structure with very fine crystallite size (about 2 nm). The optical band gaps of the samples were varied from 3.64 eV to 3.70 eV. Also, the films have a high level of transmittance of 90%. Photoluminescence spectra show the emission peaks at approximately 412 nm (3.00 eV) and 524 nm (2.38 eV). The peak with the energy of 3.00 eV is ascribed to holes trapped in magnesium ion vacancies acting as acceptors (F + center). The broad emission peak at 524 nm is related to the presence of defects (F − centers) associated with oxygen ion vacancies.

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“…There are various methods for obtaining MgO films, such as metalorganic molecular beam epitaxy [5], vapor phase epitaxy [3], sol-gel synthesis [4], reactive sputtering [6], pulsed laser deposition [7], chemical vapor deposition [8,9]. Compare to methods that listed above the spray pyrolysis has a number of advantages.…”

Section: Introductionmentioning

confidence: 99%