2010
DOI: 10.1063/1.3284949
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Compositional effects on the growth of Mg(M)O films

Abstract: The influence of the composition on the crystallographic properties of deposited Mg(M)O (with M=Al, Cr, Ti, Y, and Zr) films is studied. For a flexible control of the composition, dual reactive magnetron sputtering was used as deposition technique. Two different approaches to predict the composition are discussed. The first is an experimental way based on the simple relationship between the deposition rate and the target-substrate distance. The second is a route using a Monte Carlo based particle trajectory co… Show more

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Cited by 36 publications
(37 citation statements)
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“…In general, the MgO structure was determined under thermodynamic conditions, the increase of doping percent can decrease the mobility of adatoms (ZnO atoms) within the structure. So, the structure became kinetically not thermodynamically determined (Saraiva et al, 2010). This result was confirmed by the increase in the MgO peak broadness given in XRD results.…”
Section: Differential Thermal Analysis-thermogravimetric Analysis (Dtsupporting
confidence: 70%
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“…In general, the MgO structure was determined under thermodynamic conditions, the increase of doping percent can decrease the mobility of adatoms (ZnO atoms) within the structure. So, the structure became kinetically not thermodynamically determined (Saraiva et al, 2010). This result was confirmed by the increase in the MgO peak broadness given in XRD results.…”
Section: Differential Thermal Analysis-thermogravimetric Analysis (Dtsupporting
confidence: 70%
“…The decrease in particle size means a decrease in the crystalline behavior of the cubic MgO by incorporating ZnO. This result was explained as follows: since the ionic radius of Zn 2+ (0.083) nm is similar to that of Mg 2+ (0.078) nm, the position of Mg 2+ can be occupied by Zn 2+ (Huang et al, 2008;Saraiva et al, 2010). MgO structure is similar to the well-known NaCl structure.…”
Section: Differential Thermal Analysis-thermogravimetric Analysis (Dtmentioning
confidence: 54%
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“…With the area of the racetrack region being 10 cm², the flux of ions per pulse towards the target surface is 1.5 x 10 14 ions/cm². Considering that the sputter yield of titanium oxide is 10 to 20 times lower than the one of metallic titanium, which is 0.67 [23] for these conditions, it is clear that no complete monolayer of the target surface (around 10 15 atoms/cm 2 , [24]) gets sputtered off during one HIPIMS pulse. Therefore, the target surface will remain oxidized during the pulse and hence this cannot explain the sharp increase of the current.…”
Section: Hipims Pulsementioning
confidence: 99%