Reactions of SiF4 adsorbed on Si(111)(7 × 7) at 30 K

Wen, C.-R.; Frigo, Sean P.; Rosenberg, R. A.

doi:10.1016/0039-6028(91)90837-i

Cited by 19 publications

(11 citation statements)

References 23 publications

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“…However, we would like to point out that the desorption of Cl + ions was not observed in the photon energy range of 98-110 eV in the present experiment. On the contrary, the desorption of F + ions from SiF species at the fluorinated silicon surface by directly exciting the Si͑2p͒ core level of the bonding Si atom was observed in our present and previous experiments 31,53 and those reported by Yarmoff et al [9][10][11] We will explain the reason why the desorption of Cl + ions was not observed in the present experiment as follows.…”

Section: Fig 5 ͑A͒contrasting

confidence: 45%

“…Figure 8͑c͒ shows the F + PSD spectrum taken with the QMS analyzer at an observation angle of 45°from the surface normal. 53 This spectrum indicates that there is a threshold at ϳ103 eV ͑which peaks at ϳ106 eV͒ near the Si͑2p͒ core level. This threshold was assigned to an excitation of the Si͑2p͒ core level in a SiF 3 species.…”

Section: Continuous-time F + Psd Spectra From the Fourth Surface "Dosmentioning

confidence: 94%

“…Wen, Frigo, and Rosenberg have investigated the interaction of SiF 4 with Si͑111͒-7 ϫ 7 at 30 K using PES and angle- dependent photon-stimulated desorption. 53 For very highdosed surface, they observed that SiF 4 ice was formed. Subsequent warming of the SiF 4 -covered surface to a temperature Ͼ100 K, the angle-dependent F + PSD spectra near the Si͑2p͒ core level were measured.…”

Section: Continuous-time F + Psd Spectra From the Fourth Surface "Dosmentioning

confidence: 99%

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Continuous-time core-level photon-stimulated desorption spectroscopy for monitoring soft x-ray-induced reactions of molecules adsorbed on a single-crystal surface

Chou

Wen

2006

Phys. Rev. B

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Continuous-time core-level photon-stimulated desorption ͑PSD͒ spectroscopy was proposed for monitoring the soft x-ray-induced reactions of molecules adsorbed on a single-crystal surface. Monochromatic synchrotron radiation was used as a soft x-ray light source in the photon-induced reactions of CF 3 Cl adsorbed on a Si͑111͒-7 ϫ 7 surface at 30 K and also as a probe for studying the produced fluorination states of the bonding surface Si atom in the positive-ion PSD spectroscopy. The F + PSD spectrum was obtained by monitoring the F + signal as a function of incident photon energy near the Si͑2p͒ edge ͑98-110 eV͒. Sequential F + PSD spectra were measured as a function of photon exposure at four adsorbate coverages ͑the first dose= 0.3ϫ 10 15 molecules/ cm 2 , the second dose= 0.8ϫ 10 15 molecules/ cm 2 , the third dose= 2.2 ϫ 10 15 molecules/ cm 2 , and the fourth dose= 3.2ϫ 10 15 molecules/ cm 2 ͒. For the first and second CF 3 Cl-dosed surfaces, the sequential F + PSD spectra show the variation of their shapes with photon exposure and indicate the formation of surface SiF species. The sequential F + PSD spectra for the third and fourth CF 3 Cl-dosed surfaces also show the variation of their shapes with photon exposure and depict the production of surface SiF and SiF 3 species.

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Section: Fig 5 ͑A͒contrasting

confidence: 45%

Section: Continuous-time F + Psd Spectra From the Fourth Surface "Dosmentioning

confidence: 94%

Section: Continuous-time F + Psd Spectra From the Fourth Surface "Dosmentioning

confidence: 99%

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Continuous-time core-level photon-stimulated desorption spectroscopy for monitoring soft x-ray-induced reactions of molecules adsorbed on a single-crystal surface

Chou

Wen

2006

Phys. Rev. B

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“…Wen, Frigo, and Rosenberg have investigated the interaction of SiF 4 with the Si͑111͒-7ϫ7 surface at 30 K using PES and PSD on a relatively low photon flux beamline. 41 No photolysis was observed in the experiment. However, in a subsequent study on a high photon flux beamline, Frigo, Simons, and Rosenberg observed photolysis in the PES/PSD measurements of SiF 4 adsorbed on Ge͑100͒ surface at 30 K. 42,43 …”

Section: Resultsmentioning

confidence: 76%

Photon-stimulated desorption of F− ions from CF3Cl adsorbed on Si(111)-7×7

Wen

Chou

2004

The Journal of Chemical Physics

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We report the photon-stimulated desorption of negative ions induced by direct dipolar dissociation and dissociative electron attachment. The photon-stimulated desorption of F(-) ions from CF(3)Cl physisorbed on a Si(111)-7x7 surface at 30 K in the photon energy range 12-35 eV was studied. The F(-) ion yield exhibits four resonances, at 12.8, 16.2, 19.5, and 22.3 eV, quite unlike the gas phase photodissociation cross section. The intensities of these resonances depend strongly on the CF(3)Cl coverage in a manner which varies from peak to peak. The resonances at 19.5 and 22.3 eV, which have a significant enhancement in the monolayer regime, are due to electron mediated dipolar dissociation of adsorbed CF(3)Cl molecules. The enhancement is attributed to surface electron attachment following molecular excitation. A significant enhancement in the monolayer regime has also been observed for the resonances at 12.8 and 16.2 eV. These two resonances are ascribable to a combination of electron mediated dipolar dissociation and dissociative electron attachment driven by photoelectrons generated in the neighboring molecules.

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“…In the last few years considerable research efforts have been focused on some aspects which are still unsolved [4][5][6][7][8][9][10][11]. To give answers to the scientific questions and to achieve the technological goals, many experiments have been carried out by acting on the macroscopic and microscopic plasma parameters [2,4,7,12].…”

Section: Introductionmentioning

confidence: 99%