Rapid thermal annealing of hot implants in silicon

Coffa, S.; Calcagno, L.; Spinella, C.; Campisano, S. U.; Fóti, G.; Rimini, E.

doi:10.1016/0168-583x(89)90802-1

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Rapid thermal annealing of hot implants in silicon

Cited by 4 publications

References 4 publications

Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals

Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals

Ion channeling analysis of extended-defect annealing in silicon by rapid thermal processes

A dechanneling investigation of MeV oxygen implanted silicon

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