“…However, traps at the 2D material surface can intro-duce sources of scattering-induced noise, RTN, instability, and/or part-to-part variations that can be much larger than observed in Si MOS transistors. 73,121,134,[158][159][160][161][162][163][164][165] Finally, carbon nanotube transistors (CNTs) can show a wide range of responses, including giant LF noise if surfaces are unpassivated or if mesh percolation significantly affects transport, border-trap related noise due to charge exchange between the CNT and adjacent oxides, and/or bulk LF noise. [166][167][168][169][170][171][172][173] Knowing the microstructures of the defects that lead to LF noise and RTN enables process improvements to device response.…”