Radiation effects of keV-MeV ion irradiated PVDF

Torrisi, L.; Ciavola, G.; Fóti, G.; Percolla, R.

doi:10.1016/s0168-9002(96)00626-2

Cited by 15 publications

(11 citation statements)

References 6 publications

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“…Most fluorine atoms in polymeric chains on the irradiated PVDF surface were detached as shown in the CF 2  peak of the (b)–(e) spectra in Figure 2. The carbonization of PVDF by high‐dose low‐energy ion irradiation is similar to the results reported by many researchers by whom high‐energy ion and/or heavyweight ion irradiation has been investigated 22–24. In the PVDF irradiated by a high‐energy ion beam, C lines were significantly increased, and CH 2  and CF 2  lines were remarkably decreased.…”

Section: Resultssupporting

confidence: 85%

“…The newly formed bonds related to oxygen might be identified as (CO) and (CO) bonds. Generally, ion irradiation can only create bond scissions of CC, CH, and CF bonds randomly, and ion irradiation could reduce CH 2  and CF 2  peak simultaneously 21–24. Formation of a CC peak should appear at a lower position of CH 2  binding energy.…”

Section: Resultsmentioning

confidence: 99%

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Surface reaction on polyvinylidenefluoride (PVDF) irradiated by low energy ion beam in reactive gas environment

Han

Choi

Yoon

et al. 1999

J. Appl. Polym. Sci.

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Polyvinylidenefluoride (PVDF) was irradiated by a keV Ar ϩ ion in O 2 environment for improving adhesion between PVDF and Pt, and reaction between PVDF and the ion beam has been investigated by X-ray photoelectron spectroscopy (XPS). The adhesion test between Pt and the modified PVDF was carried out by boiling test, in which the specimens were kept in boiling water for 4 h. Two failure modes (buckling up due to weak adhesion and crack formation due to strong adhesion) of Pt films have been observed in the system. Contact angle of PVDF was reduced to 31 from 75°by the irradiation of 1 ϫ 10 15 Ar ϩ ions/cm 2 with oxygen flow rate of 8 sccm. The surface of the irradiated PVDF became more rough as ion dose increased. The improved adhesion mechanism and identification of newly formed chemical species have been confirmed by Carbon 1s and Fluorine 1s X-ray photoelectron core-level spectra. The main reaction occurred at the irradiated PVDF surface is an ion-beam-induced oxidation accompanied with preferential sputtering of fluorine. Newly formed chemical species at interface are regarded as ester and carboxyl groups. Adhesion of the Pt-PVDF interface was improved by ion irradiation in O 2 environment. This improvement is originated from the presence of carbon-oxygen bonds on the irradiated PVDF surface. Comparison of failure modes on the irradiated PVDF at various conditions after the boiling test shows that adhesion of Pt film is largely affected by the product of ion-assisted reaction.

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Section: Resultssupporting

confidence: 85%

Section: Resultsmentioning

confidence: 99%

Surface reaction on polyvinylidenefluoride (PVDF) irradiated by low energy ion beam in reactive gas environment

Han

Choi

Yoon

et al. 1999

J. Appl. Polym. Sci.

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“…Previous studies on the irradiation effects on PVDF, induced by a variety of energetic sources, such as X rays (MgK -1253.6 eV) [7], UV (2.25-3.96 eV) [8], excimer lasers (ArF-6.4 eV and KrF-5 eV) [9] and ion beams (1 keV-100 MeV) [10]- [12], reported that PVDF undergoes dehydrofluorination upon irradiation. The formation of carbon double bond was observed following dehydrofluorination along with a possibility of crosslinking between monomer chains.…”

Section: Introductionmentioning

confidence: 99%

Transfer by direct photo etching of poly(vinylidene flouride) using X-rays

Manohara

Morikawa

Choi

et al. 1999

J. Microelectromech. Syst.

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A direct pattern transfer method has been developed by photo etching poly(vinylidene fluoride) (PVDF) using X rays (1-16 keV) from a synchrotron storage ring. The ability to pattern thin film of PVDF, a piezoelectric, pyroelectric and ferroelectric polymer, has potential applications in the areas of MEMS, nonlinear optics, and nonvolatile ferroelectric random access memory technology. Without the use of any reactive chemical gas, a maximum etched depth in excess of 9 m is achieved. The etched depth for a given photon energy approaches saturation with respect to exposure time. An in situ mass spectrometry revealed the evolution of hydrogen, fluorine, and hydrogen fluoride species. The etched regions turned dark in color indicating a possible increase in the fraction of carbon atoms. The X-ray transmittance of photo etched PVDF approached that of a pure carbon as the exposure time is increased. Upon etching the root mean-square surface roughness of the etched portion increased by more than a factor of two. The rate of etching increased at elevated sample temperatures. [446]

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“…In general, IB irradiation can randomly induce scissions of C-C, C-H and C-F bonds and can simultaneously reduce the intensities of CH 2 and CF 2 peaks. [27,28] Therefore, the C=C peak should appear at a lower CH 2 binding energy. The reduction in CH 2 and CF 2 peak intensities induced by high-energy IB irradiation differed from that induced by low-energy IB irradiation.…”

Section: Resultsmentioning

confidence: 99%

Homogeneous liquid crystal alignment on poly(vinylidene fluoride-trifluoroethylene) films subjected to ion-beam irradiation

Park

et al. 2015

Liquid Crystals

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We demonstrate homogeneous and uniform liquid crystal (LC) alignment on poly(vinylidene fluoride-trifluoroethylene) [PVDF-TrFE] films using ion-beam (IB) irradiation and a performance improvement of twisted nematic (TN) cells using IB-irradiated PVDF-TrFE films. Spontaneous ferroelectricity of the PVDF-TrFE films was modified by IB irradiation, which affected the LC alignment properties. The variation in the pre-tilt angles of the LC molecules on the IB-irradiated PVDF films is attributed to surface reformation, including defluorination and oxidation because the pre-tilt angles of LC molecules can be controlled by adjusting the fluorine content. The results of contact angle measurements supported this phenomenon. A 58% reduction in the switching voltage was observed for TN cells, indicating that the IB-irradiated PVDF-TrFE films are a promising candidate for use as an alignment layer.

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Radiation effects of keV-MeV ion irradiated PVDF

Cited by 15 publications

References 6 publications

Surface reaction on polyvinylidenefluoride (PVDF) irradiated by low energy ion beam in reactive gas environment

Surface reaction on polyvinylidenefluoride (PVDF) irradiated by low energy ion beam in reactive gas environment

Transfer by direct photo etching of poly(vinylidene flouride) using X-rays

Homogeneous liquid crystal alignment on poly(vinylidene fluoride-trifluoroethylene) films subjected to ion-beam irradiation

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