Pulsed i‐PVD of Dielectric Nanodot Arrays Using a Nanoporous Template

Abstract

The results of multi‐scale numerical simulations of pulsed i‐PVD template‐assisted nanofabrication of ZnO nanodot arrays on a silicon substrate are presented. The ratios and spatial distributions of the ion fluxes deposited on the lateral and bottom surfaces of the nanopores are computed as a function of the external bias and plasma parameters. The results show that the pulsed bias plays a significant role in the ion current distribution inside the nanopores. The results of numerical experiments of this work suggest that by finely adjusting the pulse voltage, the pulse duration and the duty cycle of the external pulsed bias, the nanopore clogging can be successfully avoided during the deposition and the shapes of the deposited ZnO nanodots can be effectively controlled.

Self-organized ZnO nanodot arrays: Effective control using SiNx interlayers and low-temperature plasmas

“…[1][2][3][4] Recently, a broad range of deposition methods have been developed to prepare various ZnO nanostructures, such as nanowires, nanorods, nanobelts, nanopins, nanorings. [5][6][7][8][9] However, only a few research works have been focused on the preparation of zero-dimensional ZnO nanodots. [10][11][12] Compared with one-dimensional nanostructures, zerodimensional ZnO nanodots show a stronger exciton effect due to the three-dimensional quantum confinement.…”

Enhancement of electron field emission of vertically aligned carbon nanotubes by nitrogen plasma treatment

“…In particular, due to their high aspect ratio and small tip radius, CNTs are very suitable as electron field emission (EFE) sources for applications in the areas of flat panel displays, atomic force microscope probes, sensors, etc. [1][2][3][4][5][12][13][14][15][16][17][18].…”

Plasmas meet plasmonics

“…Methods to construct nanostructure arrays suitable for this purpose include fragmentation after thermal evaporation [179], as well as plasma-assisted nanosphere lithography [127] and plasma-assisted deposition through nanopore arrays [125,126] discussed in Section 4.2. The benefit there is that the size of the nanoparticles in template-based methods is more controllable than in stress-induced fragmentation [186] which results in a very broad island size distribution.…”

“…This in turn affects the way particles self-organise into a nano-array. Whilst the most popular methods to form nanostructures for plasmonics are currently e-beam and nanosphere lithography and nanotemplating, plasmas are a useful alternative that can be used to control the deposition of metals or metal oxides through nanoporous templates to create size uniform, regular arrays [125,126], as well as in conjunction with nanosphere lithography [127]. This control over the generation of nanostructure material, transport to and interaction with the surface is enabled by careful modification of the plasma parameters such as power, pressure, gas composition, etc.…”