2001
DOI: 10.1016/s0042-207x(00)00446-2
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Pulsed electron beam facility (GESA) for surface treatment of materials

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Cited by 110 publications
(47 citation statements)
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“…All surface modifications are carried out using the GESA facilities [2,3]. GESA I (1996) and GESA II * corresponding author; e-mail: alfons.weisenburger@ihm.fzk.de (2000) have been developed for this purpose in cooperation between the Efremov Institute St. Petersburg, Russia, and the Forschungszentrum Karlsruhe (FZK), Germany, who runs both facilities in its laboratories.…”
Section: Gesa Facilitiesmentioning
confidence: 99%
See 1 more Smart Citation
“…All surface modifications are carried out using the GESA facilities [2,3]. GESA I (1996) and GESA II * corresponding author; e-mail: alfons.weisenburger@ihm.fzk.de (2000) have been developed for this purpose in cooperation between the Efremov Institute St. Petersburg, Russia, and the Forschungszentrum Karlsruhe (FZK), Germany, who runs both facilities in its laboratories.…”
Section: Gesa Facilitiesmentioning
confidence: 99%
“…GESA I (1996) and GESA II * corresponding author; e-mail: alfons.weisenburger@ihm.fzk.de (2000) have been developed for this purpose in cooperation between the Efremov Institute St. Petersburg, Russia, and the Forschungszentrum Karlsruhe (FZK), Germany, who runs both facilities in its laboratories. Table summarises the most important parameters of the GESA I and II facilities at FZK [2]. The two facilities have the same principal setup: electron injector of triode type with a multipoint explosive emission cathode, transport channel, treatment chamber, magnetic system, high-voltage generator, pulse-duration control unit (PDCU), vacuum system, control rack, radiation protection and mechanical support.…”
Section: Gesa Facilitiesmentioning
confidence: 99%
“…At Efremov Institute, the capability of generating electron beams in the 100 -400 keV range, with long pulse durations (up to 500 µsec) has been developed. 12,13 This has been done through careful cathode source design, including multi-point emitters of carbon fiber bundles with series resistors to limit the cathode plasma velocity and hence gap closure speed. Emission from secondary surfaces is controlled, and the diode voltage held relatively constant throughout the power pulse.…”
Section: Experimental Facilities and Treatment Setup A Ion Beam mentioning
confidence: 99%
“…For applications, which require a high level of an average electron beam power [2,3], the continuous and the linear electron accelerators are usually used. The pulsed accelerators are used for relatively lower average power applications and, meanwhile, allow for a compact facility size [4,5]. As a rule, for pulsed systems, a higher pulse repetition rate means a higher productivity.…”
Section: Introductionmentioning
confidence: 99%