2003
DOI: 10.1002/cvde.200306268
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Pt Thin Film Collectors Prepared by Liquid‐Delivery Metal–Organic CVD Using Pt(C2H5C5H4)(CH3)3 for LiCoO2 Thin Film Cathodes

Abstract: Platinum thin film collectors were deposited onto p-type Si(100) planar and trench substrates by liquid-delivery metal±organ-ic (LD-MO) CVD using Pt(EtCp)Me 3 , Pt(C 2 H 5 C 5 H 4 )(CH 3 ) 3 , for microbatteries. The resistivity and root-mean-square (rms) roughness of Pt thin films with (111) preferred orientation increased with the increase of both deposition temperature and system pressure. The deposition of Pt thin films was controlled by a gas-phase mass-transfer mechanism and Pt thin films deposited at 35… Show more

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Cited by 14 publications
(10 citation statements)
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“…Although CVD is a relatively immature technique for the fabrication of thin fi lm batteries, successful depositions of several thin fi lm battery materials were demonstrated in the literature, such as lithium cobalt oxide, [ 33 , 34 , 55 , 217-219 ] vanadium oxides, [ 220 , 221 ] platinum current collectors [ 222 ] and various forms of silicon. [ 181 , 223 , 224 ] The deposition of common metal oxide layers like titanium dioxide [ 225 , 226 ] and tungsten-and molybdenum oxides, [ 227 , 228 ] that can be used as electrode materials for thin fi lm batteries, have been studied thoroughly for several other applications.…”
Section: Physical Vapor Depositionmentioning
confidence: 99%
“…Although CVD is a relatively immature technique for the fabrication of thin fi lm batteries, successful depositions of several thin fi lm battery materials were demonstrated in the literature, such as lithium cobalt oxide, [ 33 , 34 , 55 , 217-219 ] vanadium oxides, [ 220 , 221 ] platinum current collectors [ 222 ] and various forms of silicon. [ 181 , 223 , 224 ] The deposition of common metal oxide layers like titanium dioxide [ 225 , 226 ] and tungsten-and molybdenum oxides, [ 227 , 228 ] that can be used as electrode materials for thin fi lm batteries, have been studied thoroughly for several other applications.…”
Section: Physical Vapor Depositionmentioning
confidence: 99%
“…[85][86][87][88][89] The best systems for platinum reported in literature were MeCpPtMe 3 87 , EtCpPtMe 3 , 88 and (cod)Pt(Me) 2 . [85][86][87][88][89] The best systems for platinum reported in literature were MeCpPtMe 3 87 , EtCpPtMe 3 , 88 and (cod)Pt(Me) 2 .…”
Section: Low Temperature Coating Deriving From Metal-organic Precursomentioning
confidence: 99%
“…Various growth techniques have been applied to synthesize ceramic thin films. These techniques fall into at least two categories: vacuum-based methods such as chemical vapor deposition (CVD), 19 sputtering, 20 metal organic chemical vapor deposition (MOCVD), 21 atomic layer deposition (ALD), 22 and chemical solution methods including sol-gel, electrochemical deposition, and hydrothermal synthesis. 23,24 Vacuum-based techniques are an expensive investment, are limited to line-of-sight production, and usually require highvapor-pressure chemicals or high-purity targets as starting materials.…”
Section: 2mentioning
confidence: 99%