1991
DOI: 10.1116/1.585366
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Proximity correction using computer aided proximity correction (CAPROX): Evaluation and application

Abstract: Experimental evaluation method of point spread functions used for proximity effects correction in electron beam lithography J. Vac. Sci. Technol. B 29, 06F311 (2011); 10.1116/1.3656343 Adaptive neural network algorithms for computing proximity effect corrections J. Vac. Sci. Technol. B 9, 3054 (1991); 10.1116/1.585368Proximity effect correction using a dose compensation curve

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Cited by 12 publications
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“…The combination of dry etching and an advanced lithography tool such as the HL-700D has significant potential to extend then practical range of lx optical lithography. 5. Clearly more work is needed to optimize performance on reticles.…”
Section: Dry and Wet Etched Mask Platesmentioning
confidence: 96%
“…The combination of dry etching and an advanced lithography tool such as the HL-700D has significant potential to extend then practical range of lx optical lithography. 5. Clearly more work is needed to optimize performance on reticles.…”
Section: Dry and Wet Etched Mask Platesmentioning
confidence: 96%