1976
DOI: 10.1016/s0021-9258(17)33946-7
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Proteolytic enzymes of the K-1 strain of Streptomyces griseus obtained from a commercial preparation (Pronase). Purification and characterization of the carboxypeptidase.

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Cited by 15 publications
(2 citation statements)
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“…29,30 At higher applied fields a phonon-assisted tunneling mechanism occurs due to a further increase in band bending, leading to additional barrier thinning such that carriers can tunnel through the potential barrier. 31 A P−F effect occurs for charged defects only, while the tunneling mechanism is possible for defects in all charge states.…”
mentioning
confidence: 99%
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“…29,30 At higher applied fields a phonon-assisted tunneling mechanism occurs due to a further increase in band bending, leading to additional barrier thinning such that carriers can tunnel through the potential barrier. 31 A P−F effect occurs for charged defects only, while the tunneling mechanism is possible for defects in all charge states.…”
mentioning
confidence: 99%
“…Conduction mechanisms resulting in nonlinear I – V characteristics could either be contact-limited or bulk-limited. Contact-limited conduction mechanisms include Schottky emission, Fowler–Nordheim tunneling, and direct tunneling. Bulk-limited conduction mechanisms include Poole–Frenkel emission (PF), hopping conduction, space-charge limited conduction (SCLC), and phonon-assisted tunneling (PAT). In semiconductors that have a high concentration of deep-level defects, the two leading mechanisms determining conduction are PF and PAT Band bending occurs as a result of an applied electric field, which in turn results in a reduction in the defect barrier height. , The reduction in the barrier height is associated with an increased ionization rate of charge carriers . Emission of deep-level defects over this potential barrier is due to the PF mechanism, and it occurs at intermediate electric fields. , At higher applied fields a phonon-assisted tunneling mechanism occurs due to a further increase in band bending, leading to additional barrier thinning such that carriers can tunnel through the potential barrier . A P–F effect occurs for charged defects only, while the tunneling mechanism is possible for defects in all charge states.…”
mentioning
confidence: 99%