2020
DOI: 10.3390/en13030678
|View full text |Cite
|
Sign up to set email alerts
|

Properties of Thermally Evaporated Titanium Dioxide as an Electron-Selective Contact for Silicon Solar Cells

Abstract: Recently, titanium oxide has been widely investigated as a carrier-selective contact material for silicon solar cells. Herein, titanium oxide films were fabricated via simple deposition methods involving thermal evaporation and oxidation. This study focuses on characterizing an electron-selective passivated contact layer with this oxidized method. Subsequently, the SiO2/TiO2 stack was examined using high-resolution transmission electron microscopy. The phase and chemical composition of the titanium oxide films… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
8
0

Year Published

2020
2020
2024
2024

Publication Types

Select...
7

Relationship

3
4

Authors

Journals

citations
Cited by 16 publications
(8 citation statements)
references
References 36 publications
0
8
0
Order By: Relevance
“…Alternative high‐conductive contact based on low‐damage deposition processes such as chemical vapor deposition (CVD), atomic layer deposition (ALD), or remote‐plasma deposition needs to be developed. [ 94,95 ]…”
Section: Emerging Hybrid Tandem Solar Cellsmentioning
confidence: 99%
“…Alternative high‐conductive contact based on low‐damage deposition processes such as chemical vapor deposition (CVD), atomic layer deposition (ALD), or remote‐plasma deposition needs to be developed. [ 94,95 ]…”
Section: Emerging Hybrid Tandem Solar Cellsmentioning
confidence: 99%
“…In this poly‐Si passivating contact, the tunnel oxide prevents direct contact between the metal and bulk silicon, thereby reducing recombination losses. In addition, the tunnel oxide functions as a passivation layer that allows majority carriers to flow by tunneling and avoids the flow of minority carriers into the defective poly‐Si layer, leading to high carrier selectivity and an increase in cell efficiency 3–7 . The cells fabricated with rear n + poly‐Si contact and front BB R3‐diffused emitter showed a record efficiency of 26.0% 8 .…”
Section: Introductionmentioning
confidence: 99%
“…In addition, the tunnel oxide functions as a passivation layer that allows majority carriers to flow by tunneling and avoids the flow of minority carriers into the defective poly-Si layer, leading to high carrier selectivity and an increase in cell efficiency. [3][4][5][6][7] The cells fabricated with rear n + poly-Si contact and front BBR 3 -diffused emitter showed a record efficiency of 26.0%. 8 The cell with p + and n + poly-Si passivating contacts for hole and electron contacts, respectively, can further reduce recombination originating from both types of contacts and improve cell efficiency.…”
mentioning
confidence: 98%
“…Recently, a high value of carrier lifetime can be obtained by improving the silicon interface passivation characteristics [16]. Hence, studies on carrier selective contacts using carbon-based materials [17,18] and metal oxides such as TiO 2 , ZnO, and MoO x , which can be easily deposited, have attracted renewed attention [19][20][21]. Unlike conventional p-n junction cells with built-in electric fields formed by a doping process to separate photogenerated carriers, the carrier selective contact structure separates the carriers by band bending generated between the material being contacted and the silicon.…”
Section: Introductionmentioning
confidence: 99%