2008
DOI: 10.1016/j.matlet.2007.10.012
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Properties of pulse plated ZnS films

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Cited by 18 publications
(7 citation statements)
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“…ZnS is a direct band gap semiconductor, with a bandgap for films and nanoparticles reported in the literature of 3.5-4.1 eV. 16,17,[27][28][29][30][31][32][33] Cu 2 S has an indirect band gap of 1.2 eV, and a direct band gap of 2.4 eV. 34,35 UV-Vis was performed on films from all stack configurations, and results of configurations 2 and 3 are shown in Figs.…”
Section: Resultsmentioning
confidence: 99%
“…ZnS is a direct band gap semiconductor, with a bandgap for films and nanoparticles reported in the literature of 3.5-4.1 eV. 16,17,[27][28][29][30][31][32][33] Cu 2 S has an indirect band gap of 1.2 eV, and a direct band gap of 2.4 eV. 34,35 UV-Vis was performed on films from all stack configurations, and results of configurations 2 and 3 are shown in Figs.…”
Section: Resultsmentioning
confidence: 99%
“…ZnS thin films have been fabricated by several techniques, such as vacuum deposition [283], successive ionic layer adsorption and reaction process (SILAR) [284][285][286], metal-organic chemical vapor deposition (MOCVD) [287,288], molecular beam epitaxy (MBE) [289,290], spray pyrolysis [291,292], chemical bath deposition (CBD) [293,294], pulse-laser deposition [295,296], atomic layer epitaxy (ALE) [297,298], sputtering [299], sol-gel [300,301], and chemical vapor deposition [302,303]. For example, Herrero and co-workers synthesized ZnS films by CBD with a decent growth rate using NH 2 -NH 2 as a complementary complexing agent for the classically used NH 3 reaction baths.…”
Section: D Nanostructuresmentioning
confidence: 99%
“…ZnS is a direct band gap semiconductor, with a band gap for films and nanoparticles reported in the literature of 3.5-4.1 eV. [12][13][14][15][16][17][18][19] FIG. 1.…”
Section: B Photospectroscopymentioning
confidence: 99%