2005
DOI: 10.1007/s11664-005-0120-7
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Properties of phosphorus-doped (Zn,Mg)O thin films and device structures

Abstract: The properties of phosphorus-doped (Zn,Mg)O polycrystalline and epitaxial thin films are described. The as-deposited (Zn,Mg)O:P films are n type with high electron carrier density. High resistivity is induced in the films with moderate temperature annealing, which is consistent with suppression of the donor state and activation of the deep acceptor. The resistivity of the asdeposited and annealed film is an order of magnitude higher than similar samples with no Mg, consistent with a shift in the conduction ban… Show more

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Cited by 17 publications
(2 citation statements)
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“…[3][4][5] Group V elements have been shown to be the most promising dopants for producing p-type ZnO. [6][7][8] According to earlier theoretical calculations of the electronic band structure, N is predicted to be the best candidate for producing a shallow acceptor level in ZnO. 9 N doping in particular has been attempted by several groups to reach this goal.…”
Section: Introductionmentioning
confidence: 99%
“…[3][4][5] Group V elements have been shown to be the most promising dopants for producing p-type ZnO. [6][7][8] According to earlier theoretical calculations of the electronic band structure, N is predicted to be the best candidate for producing a shallow acceptor level in ZnO. 9 N doping in particular has been attempted by several groups to reach this goal.…”
Section: Introductionmentioning
confidence: 99%
“…Íàïðèêëàä, äëÿ âèï-ðÿìëÿþ÷èõ êîíòàêò³â ìåòàë-íàï³âïðîâ³äíèê áàaeàíî âèêîðèñòîâóâàòè íèçüêîîìí³ íàï³â-ïðîâ³äíèêîâ³ øàðè. Ïèòîìèé îï³ð ïë³âîê ZnO, ÿê³ âèêîðèñòîâóþòüñÿ ÿê áàçîâèé ìàòåð³àë äëÿ îäåðaeàííÿ íàï³âìàãí³òíèõ íàï³âïðîâ³äíèê³â, õàðàêòåðèçóºòüñÿ øèðîêèì ðîçêèäîì çíà÷åíü â³ä ~ 10 -2 äî 10 9 Îì•ñì, ùî çâ'ÿçàíî ç ð³çíèìè ìåòîäàìè ¿õ âèðîùóâàííÿ [1,2].…”
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