Properties of boron carbon nitride (BCN) film after plasma ashing

Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films

“…During the last 10 years a group from Osaka University, Japan, studies intensively the PECVD synthesis from BCl 3 +CH 4 +N 2 +H 2 mixtures and the properties of BC x N y films. The BC x N y films produced at 650°C were polycrystalline (Aoki et al, 2007(Aoki et al, , 2008a(Aoki et al, , 2008b(Aoki et al, , 2009a(Aoki et al, , 2009b(Aoki et al, , 2009c(Aoki et al, , 2009dEtou, et al, 2002;Kimura, et al, 2005Kimura, et al, , 2009Mazumder et al, 2009;Nesládek et al, 2001;Okada et al, 2006;Shimada et al, 2006;Sugino & Hieda, 2000;Sugino et al, 2000Sugino et al, , 2002Sugino et al, , 2008Sugino et al, , 2010Sugiyama et al, 2003Sugiyama et al, , 2002Tai et al, 2003;Umeda et al, 2004;Watanabe et al, 2008;Yuki et al, 2004;Zhang et al, 2005).…”