2006
DOI: 10.1016/j.tsf.2005.07.146
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Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD

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Cited by 12 publications
(5 citation statements)
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References 26 publications
(44 reference statements)
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“…Two main deposition techniques have been established to prepare nc-Si:H films, including plasma enhanced chemical vapor deposition (PECVD) [3] and hot-wire chemical vapor deposition (HWCVD) [4][5][6][7][8]. HWCVD appears to be a promising deposition method because of higher deposition rates, suitability for scaling up in large area industrial applications and absence of powder formation and ion bombardment in comparison to the standard PECVD [9].…”
Section: Introductionmentioning
confidence: 99%
“…Two main deposition techniques have been established to prepare nc-Si:H films, including plasma enhanced chemical vapor deposition (PECVD) [3] and hot-wire chemical vapor deposition (HWCVD) [4][5][6][7][8]. HWCVD appears to be a promising deposition method because of higher deposition rates, suitability for scaling up in large area industrial applications and absence of powder formation and ion bombardment in comparison to the standard PECVD [9].…”
Section: Introductionmentioning
confidence: 99%
“…H ydrogenated microcrystalline silicon (µc-Si:H), or nanocrystalline silicon (nc-Si:H), is a composite material, consisting of nanosized silicon crystallites surrounded by an amorphous tissue, with optical properties similar to those of crystalline silicon (c-Si). [1][2][3][4][5][6][7][8] In most cases, µc-Si:H is grown by plasma-enhanced chemical vapor deposition (PECVD) 1,[4][5][6][7] or hot-wire CVD, 8) similarly to hydrogenated amorphous silicon (a-Si:H). Compared with a-Si:H, µc-Si:H has several advantages such as a high carrier mobility and a wide spectral response (up to 1.1 eV), and thus µc-Si:H is attractive for various opt-electronic applications including thin-film transistors, [9][10][11] solar cells, [2][3][4][5]7,8,12) and optical sensors.…”
mentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8] In most cases, µc-Si:H is grown by plasma-enhanced chemical vapor deposition (PECVD) 1,[4][5][6][7] or hot-wire CVD, 8) similarly to hydrogenated amorphous silicon (a-Si:H). Compared with a-Si:H, µc-Si:H has several advantages such as a high carrier mobility and a wide spectral response (up to 1.1 eV), and thus µc-Si:H is attractive for various opt-electronic applications including thin-film transistors, [9][10][11] solar cells, [2][3][4][5]7,8,12) and optical sensors. 13) Another property that makes µc-Si:H suitable for photovoltaic applications is its high tolerance to light soaking, 5) while a-Si:H suffers from light-induced degradation.…”
mentioning
confidence: 99%
“…The demands for economically viable renewable energy sources are increasing day by day in modern society and solar energy has a great potential to satisfy the future need for such energy sources. Due to the shortcomings of the silicon-based solar energy devices [1,2], the strategy of using molecular component-based devices to build a large-scale solar power facility has developed rapidly over the past few decades. With the development of dye-sensitized solar cells (DSSCs), molecular and nanoscale devices pose a challenge to the traditional solid-state photovoltaic technology [3].…”
Section: Introductionmentioning
confidence: 99%