2022
DOI: 10.1063/5.0089750
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Progress and prospects of III-nitride optoelectronic devices adopting lift-off processes

Abstract: Lift-off processes have been developed as the enabling technology to free the epitaxial III-nitride thin film from a conventional growth substrate such as sapphire and silicon in order to realize a variety of novel device designs and structures not otherwise possible. An epitaxial lift-off (ELO) process can be adopted to transfer the entire film to an arbitrary foreign substrate to achieve various functions, including enhancement of device performance, improvement of thermal management, and to enable flexibili… Show more

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Cited by 8 publications
(3 citation statements)
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“…Because of such features, they are not universally applicable. For mechanical lift-off, even though this technique is universal, it remains difficult to manage precise crack propagation for spalling and thus the exfoliated film thickness . The most recent proposed layer transfer method, 2DLT, is free of the above issues.…”
Section: Discussionmentioning
confidence: 99%
“…Because of such features, they are not universally applicable. For mechanical lift-off, even though this technique is universal, it remains difficult to manage precise crack propagation for spalling and thus the exfoliated film thickness . The most recent proposed layer transfer method, 2DLT, is free of the above issues.…”
Section: Discussionmentioning
confidence: 99%
“…However, CLO technology faces many challenges, such as chemical pollution and high cost, and spalling technology has many drawbacks and limitations owing to the hardness of the sapphire substrate and its wurtzite crystal lattice 88,89 . LLO technology, which environmentally heats the crystal and causes damage to achieve high throughput and yield without sacrificing the wafer area, has overcome many problems associated with standard separation techniques and is therefore the most promising technology for micro-LEDs 90 .…”
Section: Laser Lift-offmentioning
confidence: 99%
“…The group III nitrides cover a wide range of band gaps (0.6-6.2 eV) [1,2]. These semiconductors are of great interest for the fabrication of optoelectronic devices [3], which may enable us to access light emission over a broad-spectrum region from infrared to ultraviolet [4,5]. Among them, GaN has been by far the most widely explored material in solid-state lighting applications [6].…”
Section: Introductionmentioning
confidence: 99%