Production of Ti films with controlled texture

Structure, Properties and Fabrication of the Solid Nanocrystalline Coatings Deposited in Several Ways

“…ОСАЖДАЕМЫЕ ТВЕРДЫЕ НАНОКРИСТАЛЛИЧЕСКИЕ ПОКРЫТИЯ 221 эффект перемешивания можно контролировать текстуру, размеры зёрен и шероховатость поверхности наносимых плёнок [91,92]. Од-нако в развитии кристаллической ориентации были обнаружены разительные отличия при увеличении отрицательного смещения U s у плёнок из чистого Ti и плёнок на основе Ti [93].…”

“…ОСАЖДАЕМЫЕ ТВЕРДЫЕ НАНОКРИСТАЛЛИЧЕСКИЕ ПОКРЫТИЯ 219 текстуры в нанокомпозитах «nTiN-Сu» и однофазных TiN покры-тиях происходит [90][91][92] механизмом столбчатого роста кристалли-тов TiN. Это связано с формированием высоких локальных внутрен-них напряжений, определяющих высокую горизонтальную и ази-мутальную кривизну-кручения решетки X ij  30 градмкм, обнару-живаемую по наличию многочисленных тонких контуров экстинк-ции (рис.…”

The phase, morphology and surface characterization of Ti–Mo alloy films prepared by magnetron sputtering

“…The relations between deposition parameters and lm structures are of fundamental importance because understanding these relations helps to control the lm growth. [16][17][18][19][20][21][22][23] During the sputtering process, the atom congurations on the substrate are essentially depend on two parameters: (i) the ratio T s /T m which controls the conventional heating process, in which T s and T m are the substrate temperature and the melting temperature of deposited materials, respectively, and (ii) the energy delivered to growing surface of the lm by particle bombardment (atomic scale heating), which is related to the deposition conditions, such as working pressure, substrate bias or sputtering power. [24][25][26] It is necessary to note that the atomic scale heating stimulates highly non-equilibrium cooling processes which results in the formation of metastable and unstable materials.…”

“…Enough bombardments are desired to provide a sufficient energy for the adatoms to form high temperature b phase at the low T s range, while too much bombardments cause interface local heating, implantation, vacancy or disruption of crystallizations in the lms. For instance, from XRD results, Ti-10 wt% Cr alloy lms have a a-Ti growth without substrate bias, but change into an amorphous growth at À150 V. 23 Also, they could have a b-Ti growth when under proper bombardment conditions. 27 The second problem is to keep the metastable b-Ti phase in the lms during the whole deposition, which depends on alloy composition of the lms and the T s .…”

High-rate magnetron sputtering

“…8 This article gives a systematic analysis of the high-rate sputtering, self-sputtering, and low pressure sputtering processes, with special attention being devoted to the physical limitations of each process. Cooling depends not only on the efficiency of the cooling circuit but also on the thermal conductivity of the target material and thickness of the target plate.…”